⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL27634809 | 0.97 | — | — | |
| SCHEMBL2272550 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL1780608 | 0.73 | TSHR (0.39) | — | |
| SCHEMBL2276087 | 0.71 | — | — | |
| SCHEMBL2104642 | 0.71 | — | — | |
| SCHEMBL18991300 | 0.71 | — | — | |
| SCHEMBL18991656 | 0.71 | TSHR (0.46) | — | |
| SCHEMBL144336 | 0.71 | — | — | |
| SCHEMBL2271768 | 0.69 | — | — | |
| SCHEMBL2274394 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-2254960-A1 | METHOD FOR THE PRODUCTION OF A HIGHLY ABRASION-RESISTANT VEHICLE PAINT, VEHICLE PAINT, AND THE USE THEREOF | Nano-X GmbH (DE) | 2010-12-01 | — | — | EP | disclosed |
| WO-2009115079-A1 | METHOD FOR THE PRODUCTION OF A HIGHLY ABRASION-RESISTANT VEHICLE PAINT, VEHICLE PAINT, AND THE USE THEREOF | NANO-X GMBH (DE) | 2009-09-24 | — | — | WO | disclosed |