SCHEMBL2276018

SCHEMBL2276018

NNOC(=O)C(O)C(O)C(=O)ONN

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.41
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3233916 0.78
SCHEMBL15610529 0.74
SCHEMBL27703328 0.74 TSHR (0.33) HIF1AHTT
SCHEMBL5155222 0.72 HIF1A (0.32) HIF1AHTT
SCHEMBL28247212 0.71 SMN1; SMN2 (0.38) HTT
SCHEMBL9159787 0.69
SCHEMBL1144851 0.67 CYP1A2 (0.35)
SCHEMBL221076 0.67
SCHEMBL29286374 0.67 SMN1; SMN2 (0.36)
SCHEMBL7070122 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108015299-A Nano-Ag particles and preparation method thereof 珠海纳金科技有限公司 2018-05-11 CN claimed
US-7332193-B2 Cobalt and nickel electroless plating in microelectronic devices ENTHONE, INC. (US) 2008-02-19 US claimed
CN-101080280-A Cobalt and nickel electroless plating in microelectronic devices ENTHONE (US) 2007-11-28 CN claimed
EP-1807218-A1 COBALT AND NICKEL ELECTROLESS PLATING IN MICROELECTRONIC DEVICES ENTHONE INC. (US) 2007-07-18 EP claimed
WO-2006044990-A1 COBALT AND NICKEL ELECTROLESS PLATING IN MICROELECTRONIC DEVICES ENTHONE INC. (US) 2006-04-27 WO claimed
US-20060083850-A1 Cobalt and nickel electroless plating in microelectronic devices ENTHONE INC. (US) 2006-04-20 US claimed
US-4358426-A SOLVENT EXTRACTION OF URANIUM, PLUTONIUM OR ZIRCONIUM COMPOUND WITH AQUEOUS SOLUTION OF HYDRAZINE SALT THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1982-11-09 US claimed
US-4091172-A SILVER FILM DEPOSITED OVER GOLD FILM BY ELECTROLESS DEPOSITION PPG INDUSTRIES, INC. (US) 1978-05-23 US claimed
US-4005229-A Novel method for the rapid deposition of gold films onto non-metallic substrates at ambient temperatures PPG INDUSTRIES, INC. (US) 1977-01-25 US claimed
JP-4311583-A None JP disclosed
CN-119569535-A Production process and production system of hexafluoroisopropanol 中化蓝天氟材料有限公司 2025-03-07 CN disclosed
US-11469006-B2 Suppression of radionuclide deposition on nuclear power plant components DOMINION ENGINEERING, INC. (US) 2022-10-11 US disclosed
EP-2979781-B1 CONDUCTIVE PARTICLES, METHOD OF MANUFACTURING THE SAME, CONDUCTIVE RESIN COMPOSITION CONTAINING SAME, AND CONDUCTIVE COATED OBJECT TOYO ALUMINIUM KK (JP) 2022-02-16 EP disclosed
EP-3494090-A2 SUPPRESSION OF RADIONUCLIDE DEPOSITION ON NUCLEAR POWER PLANT COMPONENTS Dominion Engineering, Inc. (US) 2019-06-12 EP disclosed
US-4695489-A Electroless nickel plating composition and method GENERAL ELECTRIC COMPANY (US) 1987-09-22 US disclosed
EP-0228845-A2 N-containing heterocyclic compounds, processes for the preparation thereof and composition comprising the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1987-07-15 EP disclosed
US-4358426-A SOLVENT EXTRACTION OF URANIUM, PLUTONIUM OR ZIRCONIUM COMPOUND WITH AQUEOUS SOLUTION OF HYDRAZINE SALT THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1982-11-09 US disclosed
US-4091172-A SILVER FILM DEPOSITED OVER GOLD FILM BY ELECTROLESS DEPOSITION PPG INDUSTRIES, INC. (US) 1978-05-23 US disclosed
US-4091128-A Electroless gold plating bath PPG INDUSTRIES, INC. (US) 1978-05-23 US disclosed
US-4005229-A Novel method for the rapid deposition of gold films onto non-metallic substrates at ambient temperatures PPG INDUSTRIES, INC. (US) 1977-01-25 US disclosed