SCHEMBL2282302

SCHEMBL2282302

CCCOC12C=CC=CC1O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27492701 0.74
SCHEMBL7160675 0.70
SCHEMBL28459887 0.68
SCHEMBL28888488 0.63
SCHEMBL28301909 0.63
SCHEMBL8215344 0.61
SCHEMBL7703227 0.59 POLA1 (0.32)
SCHEMBL28574955 0.59
SCHEMBL28678028 0.59
SCHEMBL28457639 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100092894-A1 Bottom Antireflective Coating Compositions AZ ELECTRONIC MATERIALS USA CORP. 2010-04-15 US claimed
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US claimed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US claimed
US-11926748-B2 Thermosetting compositions and forming three-dimensional objects therefrom STRATASYS, INC. (US) 2024-03-12 US disclosed
US-20230106589-A1 THERMOSETTING COMPOSITIONS AND FORMING THREE-DIMENSIONAL OBJECTS THEREFROM STRATASYS INC. 2023-04-06 US disclosed
CN-102575127-B Antifeflective composition for photoresists AZ ELECTRONIC MATERIALS USA 2014-08-13 CN disclosed
EP-2537068-B1 ANTIREFLECTIVE COMPOSITIONS AND METHODS OF USING SAME AZ ELECTRONIC MATERIALS USA (US) 2014-02-12 EP disclosed
US-8551686-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-10-08 US disclosed
US-8507192-B2 Antireflective compositions and methods of using same AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-08-13 US disclosed
EP-2052293-B1 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA (US) 2013-03-13 EP disclosed
CN-101824141-B Process for making polyesters AZ ELECTRONIC MATERIALS USA 2012-07-04 CN disclosed
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US disclosed
CN-1234769-C Polymer composites containing alkylene oxide copolymers UNION CARBIDE CHEM PLASTIC (US) 2006-01-04 CN disclosed
US-20050234201-A1 Process for making polyesters MERCK PATENT GMBH (DE) 2005-10-20 US disclosed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US disclosed
US-6825273-B2 WATER-SENSITIVE COPOLYMER COMPRISING ALKYLENE OXIDE AND EPOXY-FUNCTIONAL COMONOMERS; AND WATER INSOLUBLE POLYMER; WET LUBRICATING; CATHETERS, SHAVERS, MEDICAL EQUIPMENT UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION 2004-11-30 US disclosed
US-20040127646-A1 Polymer composites containing alkylene oxide copolymers UNION CARBIDE CORPORATION 2004-07-01 US disclosed
CN-1455801-A Polymer composites containing alkylene oxide copolymers UNION CARBIDE CHEM PLASTIC (US) 2003-11-12 CN disclosed
EP-1319044-A1 POLYMER COMPOSITES CONTAINING ALKYLENE OXIDE COPOLYMERS UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 2003-06-18 EP disclosed
WO-2002022739-A1 POLYMER COMPOSITES CONTAINING ALKYLENE OXIDE COPOLYMERS UNION CARBIDE CHEMICALS & PLASTICS (US) 2002-03-21 WO disclosed