SCHEMBL2282812

SCHEMBL2282812

[CH2]CC[CH]NC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2278627 0.83
SCHEMBL2285353 0.81
SCHEMBL2282325 0.79
SCHEMBL2284178 0.79
SCHEMBL2283516 0.79
SCHEMBL2281144 0.79
SCHEMBL2284134 0.79
SCHEMBL2281687 0.79
SCHEMBL7834164 0.75
SCHEMBL3251204 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7994273-B2 Photoactive materials ROLIC AG (CH) 2011-08-09 US claimed
US-7750185-B2 Photoactive materials ROLIC AG (CH) 2010-07-06 US claimed
US-20050288480-A1 Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked ROLIC AG (CH) 2005-12-29 US claimed
EP-1525182-A1 PHOTOACTIVE MATERIALS Rolic AG (CH) 2005-04-27 EP claimed
WO-2004013086-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2004-02-12 WO claimed
EP-1386910-A1 Photoactive materials Rolic AG (CH) 2004-02-04 EP claimed
EP-1525182-B1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2016-04-06 EP disclosed
US-8436132-B2 Photoactive materials ROLIC AG (CH) 2013-05-07 US disclosed
US-20110236602-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2011-09-29 US disclosed
US-7994273-B2 Photoactive materials ROLIC AG (CH) 2011-08-09 US disclosed
US-20100272979-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2010-10-28 US disclosed
US-7750185-B2 Photoactive materials ROLIC AG (CH) 2010-07-06 US disclosed
US-20050288480-A1 Liquid crystals adjustment layers containing diamine compound; polyamic acid or polyimides; crosslinked ROLIC AG (CH) 2005-12-29 US disclosed
EP-1525182-A1 PHOTOACTIVE MATERIALS Rolic AG (CH) 2005-04-27 EP disclosed
WO-2004013086-A1 PHOTOACTIVE MATERIALS ROLIC AG (CH) 2004-02-12 WO disclosed
EP-1386910-A1 Photoactive materials Rolic AG (CH) 2004-02-04 EP disclosed
US-5607812-A CONTAINS /1/ALKALI PROCESSING ELEMENT WITH TERTIARY AMINE POLYMER AND SURFACE-ACTIVE OLIGOMER OR POLYMER AND /2/LIGHT SENSITIVE SILVER HALIDE ELEMENT WITH DYE IMAGE-FORMING SUBSTANCES AND DYE IMAGE-RECEIVING ELEMENTS OR LAYERS FUJI PHOTO FILM CO., LTD. (JP) 1997-03-04 US disclosed
US-5447818-A Developer solution containing polymer with pendant amine groups, high density transfer image FUJI PHOTO FILM CO, LTD. (JP) 1995-09-05 US disclosed