SCHEMBL22876058

SCHEMBL22876058

O[C@@]1(c2ccc(-c3ccccc3)cc2)c2ccccc2-c2cc3ccccc3cc21

nearest known ligand 0.48

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ PDK2 Q15119 19/20 0.48
▸ THRB P10828 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26403429 1.00 PDK2 (0.48) PDK2THRBTDP1
SCHEMBL12938481 0.97 PDK2 (0.43) PDK2
SCHEMBL18167756 0.90 PDK2 (0.41) PDK2THRBTDP1
SCHEMBL22876054 0.87 PDK2 (0.50) PDK2THRBTDP1
SCHEMBL13276033 0.85 PDK2 (0.42) PDK2
SCHEMBL22875763 0.85 PDK2 (0.52) PDK2
SCHEMBL19038942 0.84 PDK2 (0.48) PDK2
SCHEMBL23800102 0.84 SLC6A4 (0.44) PDK2
SCHEMBL14970800 0.83 PDK2 (0.45) PDK2THRBTDP1
SCHEMBL31576206 0.83 PDK2 (0.45) PDK2THRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-20210011384-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-14 — — US disclosed
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