SCHEMBL2293417

SCHEMBL2293417

C=CCNCC=C.[S]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2334306 0.96
SCHEMBL22105 0.96
Ammonia Solution, Strong SCHEMBL797498 0.92
SCHEMBL7851077 0.92
SCHEMBL9285293 0.92
Methane SCHEMBL23927285 0.92
SCHEMBL16738682 0.92
SCHEMBL9402771 0.92 TSHR (0.36)
Hydrochloric Acid SCHEMBL220991 0.92
SCHEMBL3312437 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118382708-B Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2025-04-15 CN claimed
CN-118382708-A Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2024-07-23 CN claimed
US-11235587-B2 Inkjet pre-treatment fluid for dye sublimation printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-02-01 US claimed
US-20250388771-A1 INK SET FOR THERMAL TRANSFER SHEET, THERMAL TRANSFER SHEET, METHOD FOR PRODUCING THERMAL TRANSFER SHEET, AND METHOD FOR PRODUCING TRANSFER PRINTED MATTER RISO KAGAKU CORP (JP) 2025-12-25 US disclosed
US-20250289972-A1 INK SET FOR THERMAL TRANSFER SHEET AND METHOD FOR PRODUCING THERMAL TRANSFER SHEET RISO KAGAKU CORPORATION (JP) 2025-09-18 US disclosed
US-20250270446-A1 COMPOSITION, METHOD OF TREATING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF PREPARING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-08-28 US disclosed
CN-118382708-B Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2025-04-15 CN disclosed
CN-118382708-B Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2025-04-15 CN disclosed
US-20250011650-A1 ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-09 US disclosed
EP-4481797-A1 ETCHING COMPOSITION, METAL-CONTAINING FILM ETCHING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME Samsung Electronics Co., Ltd. (KR) 2024-12-25 EP disclosed
CN-118382708-A Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2024-07-23 CN disclosed
CN-118382708-A Method for detecting mutation in target base sequence of nucleic acid, method for selectively suppressing amplification of nucleic acid, and kit for carrying out the same 日东纺绩株式会社 2024-07-23 CN disclosed
US-11401431-B2 Thermal inkjet ink and colorless pre-treatment fluid HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-08-02 US disclosed
US-11235587-B2 Inkjet pre-treatment fluid for dye sublimation printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-02-01 US disclosed
US-8399256-B2 Method for introducing gene into cell, and composition for use in the method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-03-19 US disclosed
US-20110201120-A1 METHOD FOR INTRODUCING GENE INTO CELL, AND COMPOSITION FOR USE IN THE METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-08-18 US disclosed