SCHEMBL2298612

SCHEMBL2298612

C1=C=CC=1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28053455 0.79
SCHEMBL6165452 0.63
SCHEMBL2295963 0.60
SCHEMBL6559802 0.45
Charcoal, Activated SCHEMBL3432143 0.45
SCHEMBL23235911 0.45
SCHEMBL3392733 0.45
SCHEMBL1285 0.45
SCHEMBL1461498 0.45
SCHEMBL10364713 0.45

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8003712-B2 Resin composition and process for producing resin molding SONY CORPORATION (JP) 2011-08-23 US disclosed
EP-2256166-A1 Resin composition and process for producing resin molding Sony Corporation (JP) 2010-12-01 EP disclosed
US-20100144936-A1 RESIN COMPOSITION AND PROCESS FOR PRODUCING RESIN MOLDING SONY CORPORATION (JP) 2010-06-10 US disclosed
US-7691928-B2 Resin composition and process for producing resin molding SONY CORPORATION (JP) 2010-04-06 US disclosed
US-7671117-B2 Resin composition SONY CORPORATION (JP) 2010-03-02 US disclosed
US-20090005475-A1 RESIN COMPOSITION SONY CORPORATION (JP) 2009-01-01 US disclosed
EP-1990365-A1 Resin composition Sony Corporation (JP) 2008-11-12 EP disclosed
US-20060167134-A1 Resin composition and process for producing resin molding Lerner, David, Littenberg, Krumholz & Mentlik, LLP 2006-07-27 US disclosed
EP-1591487-A1 RESIN COMPOSITION AND PROCESS FOR PRODUCING RESIN MOLDING Sony Corporation (JP) 2005-11-02 EP disclosed
EP-1538184-A1 RESIN COMPOSITION Sony Corporation (JP) 2005-06-08 EP disclosed
US-20050014870-A1 Resin composition SONY CORPORATION (JP) 2005-01-20 US disclosed
US-RE31522-E COPOLYMERS OF DIAMINE-ENDCAPPED POLYOXYETHYLENE GLYCOLS AND A DICARBOXYLIC ACID; HYDRAULIC FLUIDS; METAL WORKING CINCINNATI MILACRON INC. (US) 1984-02-14 US disclosed
US-4374741-A LUBRICANTS, METAL WORKING, POLYETHER BLOCK POLYMERJ CINCINNATI MILACRON INC. (US) 1983-02-22 US disclosed