SCHEMBL2298929

SCHEMBL2298929

C1=CCC=1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2297719 0.76
SCHEMBL2275919 0.60
SCHEMBL4175824 0.54
SCHEMBL2326 0.51
SCHEMBL2088 0.51
SCHEMBL2295963 0.51
SCHEMBL22260 0.46
SCHEMBL1112761 0.46
SCHEMBL1112757 0.46
SCHEMBL322564 0.46

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111533764-B Method for preparing siloxyindene derivative by utilizing domino reaction 杭州师范大学 2023-06-06 CN claimed
CN-111533764-A Method for preparing siloxyindene derivative by using domino reaction 杭州师范大学 2020-08-14 CN claimed
CN-107176914-A New GVS series compounds and application thereof 浙江旭晨医药科技有限公司 2017-09-19 CN claimed
US-8673682-B2 High order silane composition and method of manufacturing a film-coated substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2014-03-18 US claimed
CN-111533764-B Method for preparing siloxyindene derivative by utilizing domino reaction 杭州师范大学 2023-06-06 CN disclosed
CN-111533764-A Method for preparing siloxyindene derivative by using domino reaction 杭州师范大学 2020-08-14 CN disclosed
CN-107176914-A New GVS series compounds and application thereof 浙江旭晨医药科技有限公司 2017-09-19 CN disclosed
US-9260382-B2 Methods of reducing virulence in bacteria UWM RESEARCH FOUNDATION (US) 2016-02-16 US disclosed
US-8876917-B2 Lithium-ion secondary battery HITACHI MAXELL, LTD. (JP) 2014-11-04 US disclosed
US-8673682-B2 High order silane composition and method of manufacturing a film-coated substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2014-03-18 US disclosed
US-20120322769-A1 METHODS OF REDUCING VIRULENCE IN BACTERIA DUKE UNIVERSITY (US) 2012-12-20 US disclosed
US-20110318939-A1 HIGH ORDER SILANE COMPOSITION AND METHOD OF MANUFACTURING A FILM-COATED SUBSTRATE JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2011-12-29 US disclosed
WO-1998006709-A1 CYCLIC UREA COMPOUNDS, THEIR PRODUCTION AND USE AS HERBICIDES TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1998-02-19 WO disclosed
EP-0284086-B1 Molding resin composition SUMITOMO DOW LTD (JP) 1995-12-13 EP disclosed
EP-0303782-B1 Resin Composition SUMITOMO DOW LTD (JP) 1995-01-11 EP disclosed
US-5371142-A Heat resistance, chemical resistance, impact strength, weld resistance SUMITOMO DOW LIMITED (JP) 1994-12-06 US disclosed
US-4880874-A MOLDING MATERIALS SUMITOMO NAUGATUCK CO., LTD. (JP) 1989-11-14 US disclosed
US-4855355-A IMPROVED STRENGTH, STIFFNESS AND MOLD SHRINKAGE SUMITOMO NAUGATUCK CO., LTD. (JP) 1989-08-08 US disclosed
EP-0303782-A2 Resin Composition Sumitomo Dow Limited (JP) 1989-02-22 EP disclosed
EP-0300051-A1 RESIN COMPOSITION Sumitomo Dow Limited (JP) 1989-01-25 EP disclosed