SCHEMBL23089937

SCHEMBL23089937

CCCCCOc1c2ccccc2cc2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TLR8 Q9NR97 2/20 0.46
CNR1 P21554 2/20 0.44
CNR2 P34972 2/20 0.44
CYP2C9 P11712 1/20 0.44
LTA4H P09960 1/20 0.44
FAAH O00519 1/20 0.44
MGLL Q99685 1/20 0.44
SLC2A1 P11166 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
ABCB11 O95342 1/20 0.43
LMNA P02545 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2D6 P10635 1/20 0.43
SCN1A P35498 1/20 0.43
SCN2A Q99250 1/20 0.43
SCN3A Q9NY46 1/20 0.43
MAPT P10636 1/20 0.43
GAA P10253 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
HTR1B P28222 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29368699 1.00 TLR8 (0.46) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL29368730 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL3999665 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL29369026 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL23089961 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL23271667 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL23089944 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL23089946 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
SCHEMBL29371854 0.98 TLR8 (0.48) TLR8CNR1CNR2CYP2C9LTA4H
Methyl Alcohol SCHEMBL5696273 0.95 SLC2A1 (0.47) TLR8CNR1CNR2CYP2C9LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
CN-113166043-A Electrolyte for sulfur-based magnesium battery 富士胶片和光纯药株式会社 2021-07-23 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 CN disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 CN disclosed