SCHEMBL23089963

SCHEMBL23089963

CCCCCCCOc1c2ccccc2cc2ccc(C)cc12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 1/20 0.43
TLR8 Q9NR97 2/20 0.41
CNR2 P34972 3/20 0.40
CNR1 P21554 2/20 0.40
FAAH O00519 1/20 0.40
MGLL Q99685 1/20 0.40
TDP1 Q9NUW8 3/20 0.39
MAPT P10636 1/20 0.39
GAA P10253 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
GPBAR1 Q8TDU6 1/20 0.39
MCHR1 Q99705 1/20 0.38
CYP2C9 P11712 1/20 0.38
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38
HDAC11 Q96DB2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23271665 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL23089927 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL29370956 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL29372381 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL23089911 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL29372118 1.00 SLC2A1 (0.43) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL29371832 0.99 SLC2A1 (0.41) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL23089896 0.99 SLC2A1 (0.41) SLC2A1TLR8CNR2CNR1FAAH
SCHEMBL23089941 0.94 SLC2A1 (0.44) SLC2A1TLR8CNR2TDP1GAA
SCHEMBL29372017 0.94 SLC2A1 (0.44) SLC2A1TLR8CNR2TDP1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 CN disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 CN disclosed