SCHEMBL23096830

SCHEMBL23096830

CC1(C)C2CC(=O)C1(CS)C2

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.41
▸ ALDH1A1 P00352 3/20 0.39
▸ MEN1 O00255 3/20 0.38
▸ LMNA P02545 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ F2 P00734 2/20 0.38
▸ PRSS1 P07477 2/20 0.38
▸ PRSS2 P07478 2/20 0.38
▸ PRSS3 P35030 2/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ GAA P10253 1/20 0.35
▸ PKM P14618 1/20 0.35
▸ KDM4E B2RXH2 1/20 0.34
▸ PTPN1 P18031 1/20 0.33
▸ CA1 P00915 4/20 0.33
▸ CA2 P00918 4/20 0.33
▸ CA5A P35218 4/20 0.33
▸ CA5B Q9Y2D0 4/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12503382 0.81 KMT2A (0.58) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL25680749 0.81 KMT2A (0.58) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL12996955 0.81 KMT2A (0.58) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL13761872 0.81 KMT2A (0.58) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL18408595 0.74 KMT2A (0.48) KMT2AALDH1A1MEN1F2PRSS1
SCHEMBL20182735 0.74 KMT2A (0.48) KMT2AALDH1A1MEN1F2PRSS1
SCHEMBL10790223 0.69 KMT2A (0.58) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL5545684 0.68 CYP1A2 (0.53) KMT2AALDH1A1MEN1F2PRSS1
SCHEMBL27669444 0.68 KMT2A (0.61) KMT2AALDH1A1MEN1LMNAMAPT
SCHEMBL411430 0.67 KMT2A (0.59) KMT2AALDH1A1MEN1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2539769-B1 PATTERN FORMING METHOD AND RESIST COMPOSITION FUJIFILM CORP (JP) 2021-04-07 — — EP disclosed
EP-1811339-B1 Pattern forming method FUJIFILM CORP (JP) 2021-03-17 — — EP disclosed
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