Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23143114 | 0.75 | CYP1A2 (0.37) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL3080573 | 0.74 | POLB (0.38) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL23143050 | 0.74 | CYP1A2 (0.39) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL24249563 | 0.72 | POLB (0.37) | EPHX2POLBEPHX1HSD11B1 | |
| SCHEMBL23143123 | 0.70 | POLB (0.49) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL23143084 | 0.68 | POLB (0.46) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL17717501 | 0.67 | CYP19A1 (0.50) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL3069400 | 0.66 | MAPT (0.34) | POLB | |
| SCHEMBL17703637 | 0.66 | POLB (0.41) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL18775645 | 0.66 | CYP1A2 (0.38) | EPHX2CYP1A2CYP2D6CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210088905-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-03-25 | — | — | US | disclosed |