⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9327805 | 0.71 | — | — | |
| SCHEMBL30294198 | 0.71 | — | — | |
| SCHEMBL8028679 | 0.71 | — | — | |
| SCHEMBL6571832 | 0.71 | — | — | |
| SCHEMBL29522309 | 0.71 | — | — | |
| SCHEMBL29354344 | 0.71 | — | — | |
| SCHEMBL4783681 | 0.50 | — | — | |
| SCHEMBL277750 | 0.50 | — | — | |
| SCHEMBL2004517 | 0.50 | — | — | |
| Hydrochloric Acid SCHEMBL37689 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1661160-A4 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECH MATERIALS (US) | 2008-07-02 | — | — | EP | claimed |
| US-7294528-B2 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-11-13 | — | — | US | claimed |
| US-7119418-B2 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-10-10 | — | — | US | claimed |
| US-20060178006-A1 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | XU CHONGYING | 2006-08-10 | — | — | US | claimed |
| EP-1661160-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | Advanced Technology Materials, Inc. (US) | 2006-05-31 | — | — | EP | claimed |
| US-7030168-B2 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-04-18 | — | — | US | claimed |
| US-20050181613-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. | 2005-08-18 | — | — | US | claimed |
| WO-2005013331-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-02-10 | — | — | WO | claimed |
| US-20040023453-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ATMI, INC. | 2004-02-05 | — | — | US | claimed |
| WO-2003058680-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-07-17 | — | — | WO | claimed |
| US-20030124785-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ATMI, INC. | 2003-07-03 | — | — | US | claimed |
| US-8562743-B2 | Method and apparatus for atomic layer deposition | TOKYO ELECTRON LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| EP-2060577-B1 | Copper precursors for thin film deposition | AIR PROD & CHEM (US) | 2013-08-21 | — | — | EP | disclosed |
| US-8263795-B2 | Copper precursors for thin film deposition | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-09-11 | — | — | US | disclosed |
| US-20110203523-A1 | METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20050181613-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ADVANCED TECHNOLOGY MATERIALS, INC. | 2005-08-18 | — | — | US | disclosed |
| WO-2005013331-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-02-10 | — | — | WO | disclosed |
| US-20040023453-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ATMI, INC. | 2004-02-05 | — | — | US | disclosed |
| WO-2003058680-A2 | SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-07-17 | — | — | WO | disclosed |
| US-20030124785-A1 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | ATMI, INC. | 2003-07-03 | — | — | US | disclosed |