⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10589487 | 1.00 | — | — | |
| SCHEMBL5187739 | 1.00 | — | — | |
| SCHEMBL5186095 | 0.97 | — | — | |
| SCHEMBL2516177 | 0.87 | — | — | |
| SCHEMBL9668013 | 0.83 | TSHR (0.35) | — | |
| SCHEMBL18660194 | 0.83 | TSHR (0.35) | — | |
| SCHEMBL9421489 | 0.83 | TSHR (0.35) | — | |
| SCHEMBL9421453 | 0.83 | TSHR (0.35) | — | |
| SCHEMBL7870810 | 0.83 | — | — | |
| SCHEMBL9670647 | 0.83 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023002853-A1 | ACRYLIC RESIN FOR INK | 株式会社日本触媒 | 2023-01-26 | — | — | WO | disclosed |
| US-9441065-B2 | Curable composition for imprints, cured product and method for manufacturing a cured product | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-8999221-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8883065-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2014-11-11 | — | — | US | disclosed |
| US-20140121292-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2014-05-01 | — | — | US | disclosed |
| US-20110236595-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |
| EP-2352768-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2011-08-10 | — | — | EP | disclosed |
| WO-2010064726-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-06-10 | — | — | WO | disclosed |