⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22548 | 0.88 | — | — | |
| SCHEMBL27823328 | 0.88 | — | — | |
| SCHEMBL13007313 | 0.87 | — | — | |
| SCHEMBL21494561 | 0.87 | — | — | |
| SCHEMBL1456083 | 0.87 | — | — | |
| Hydroxyl Radical SCHEMBL28871487 | 0.86 | TSHR (0.32) | — | |
| Ethylene SCHEMBL9421815 | 0.86 | — | — | |
| SCHEMBL31432764 | 0.86 | — | — | |
| SCHEMBL8418496 | 0.86 | — | — | |
| SCHEMBL7583255 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 282 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12331164-B2 | Curable siloxane resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-06-17 | — | — | US | claimed |
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| CN-119592056-A | Durable light-colored antistatic master batch, fiber and preparation method thereof | 东华大学 | 2025-03-11 | — | — | CN | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-20230078587-A1 | CURABLE SILOXANE RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2023-03-16 | — | — | US | claimed |
| CN-111565859-B | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| EP-0317858-B1 | RADIATION CURABLE COATING COMPOSITION BASED ON A SILICA/VINYL-FUNCTIONAL SILANOL DISPERSION | HOECHST CELANESE CORPORATION (US) | 1992-06-03 | — | — | EP | claimed |
| EP-0317858-A2 | Radiation curable coating composition based on a silica/vinyl-functional silanol dispersion | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | claimed |
| US-4822828-A | RADIATION TRANSPARENT, WEAR RESISTANT PROTECTIVE COATING | HOECHST CELANESE CORPORATION (US) | 1989-04-18 | — | — | US | claimed |
| US-4654382-A | TRIGLYCIDYL ETHER OF TRISPHENOL, POLYFUNCTIONAL EPOXY, AND THE REACTION PRODUCT OF AN AROMATIC, DIAMINE, DIVINYLDIS LOXANE, AND BISMALEIMIDE; CURING | THE YOKOHAMA RUBBER CO., LTD. (JP) | 1987-03-31 | — | — | US | claimed |