⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12672278 | 0.84 | — | — | |
| SCHEMBL16135254 | 0.82 | — | — | |
| SCHEMBL19102099 | 0.80 | — | — | |
| SCHEMBL24257963 | 0.80 | — | — | |
| SCHEMBL20671524 | 0.79 | — | — | |
| SCHEMBL12660837 | 0.79 | — | — | |
| SCHEMBL19033774 | 0.79 | — | — | |
| SCHEMBL14889408 | 0.78 | — | — | |
| SCHEMBL8317506 | 0.78 | — | — | |
| SCHEMBL13458116 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230045307-A1 | REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND METHOD FOR PRODUCING RESIST PATTERNS USING THE SAME | MERCK PATENT GMBH (DE) | 2023-02-09 | — | — | US | disclosed |
| US-11365379-B2 | Photoresist remover compositions | MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) | 2022-06-21 | — | — | US | disclosed |
| US-20210115362-A1 | PHOTORESIST REMOVER COMPOSITIONS | MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) | 2021-04-22 | — | — | US | disclosed |