Bromide

Bromide

SCHEMBL2332267

Br.CCP(CC)CC

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL6722327 1.00
Bromide SCHEMBL6722331 1.00
Bromide SCHEMBL7930681 0.95
SCHEMBL41401 0.94
SCHEMBL5409330 0.94
SCHEMBL23495442 0.89
SCHEMBL8760150 0.89
SCHEMBL1985723 0.89
Phosphine SCHEMBL22589046 0.89
SCHEMBL5589491 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111690120-A Epoxy resin for low-temperature curing powder coating, preparation method of epoxy resin and low-temperature curing powder coating 安徽善孚新材料科技股份有限公司 2020-09-22 CN claimed
CN-1210318-C Addition polymers derived from norbornene-functional monomers and process therefor SUMITOMO BAKELITE CO (JP) 2005-07-13 CN claimed
CN-1229094-A Addition polymers derived from norbornene-functional monomers and process therefor GOODRICH CO B F (US) 1999-09-22 CN claimed
EP-0729480-B1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR GOODRICH CO B F (US) 1999-01-27 EP claimed
CN-1135225-A Addition polymers from norbornene-functional monomers and methods of making the same GOODRICH CO B F (US) 1996-11-06 CN claimed
EP-3166981-B1 OLIGOSACCHARIDE COMPOSITIONS AND METHODS FOR PRODUCING THEREOF DSM NUTRITIONAL PRODUCTS LLC (US) 2026-05-13 EP disclosed
US-12514267-B2 Oligosaccharide compositions for use as animal feed and methods of producing thereof DSM NUTRITIONAL PRODUCTS, LLC (US) 2026-01-06 US disclosed
US-20250057202-A1 OLIGOSACCHARIDE COMPOSITIONS FOR USE AS FOOD INGREDIENTS AND METHODS OF PRODUCING THEREOF DSM NUTRITIONAL PRODUCTS LLC (US) 2025-02-20 US disclosed
US-20230255240-A1 OLIGOSACCHARIDE COMPOSITIONS FOR USE AS ANIMAL FEED AND METHODS OF PRODUCING THEREOF MIDORI USA, INC. 2023-08-17 US disclosed
CN-115155656-B Catalyst for synthesizing cyclic carbonate and synthetic method of cyclic carbonate 深圳新宙邦科技股份有限公司 2023-07-11 CN disclosed
EP-4205553-A1 OLIGOSACCHARIDE COMPOSITIONS FOR USE ANIMAL FEED AND METHODS OF PRODUCING THEREOF DSM Nutritional Products, LLC (US) 2023-07-05 EP disclosed
US-11653676-B2 Oligosaccharide compositions for use as animal feed and methods of producing thereof DSM NUTRITIONAL PRODUCTS, LLC (US) 2023-05-23 US disclosed
US-7041820-B2 Process for producing (dioxolenon-4-yl)methyl ester derivative NIPPON SODA CO., LTD. (JP) 2006-05-09 US disclosed
CN-1210318-C Addition polymers derived from norbornene-functional monomers and process therefor SUMITOMO BAKELITE CO (JP) 2005-07-13 CN disclosed
US-6803092-B2 Selective deposition of circuit-protective polymers 3M INNOVATIVE PROPERTIES COMPANY 2004-10-12 US disclosed
US-20040133016-A1 Process for producing (dioxolenon-4-yl)methyl ester derivative NIPPON SODA CO., LTD. (JP) 2004-07-08 US disclosed
EP-1406977-A1 SELECTIVE DEPOSITION OF CIRCUIT-PROTECTIVE POLYMERS 3M Innovative Properties Company (US) 2004-04-14 EP disclosed
EP-1375492-A1 PROCESS FOR PRODUCING (DIOXOLENON-4-YL)METHYL ESTER DERIVATIVE NIPPON SODA CO., LTD. (JP) 2004-01-02 EP disclosed
US-20030008156-A1 Selective deposition of circuit-protective polymers 3M INNOVATIVE PROPERTIES COMPANY 2003-01-09 US disclosed
WO-2003002675-A1 SELECTIVE DEPOSITION OF CIRCUIT-PROTECTIVE POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2003-01-09 WO disclosed