SCHEMBL23345967

SCHEMBL23345967

S[SH](S)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13940292 0.61
SCHEMBL23013525 0.61
SCHEMBL3431209 0.50
SCHEMBL2523524 0.50
SCHEMBL11499404 0.50
Hydrogen Sulfide SCHEMBL1412215 0.50
SCHEMBL16429593 0.35
SCHEMBL29172 0.35
SCHEMBL4183792 0.29
SCHEMBL8984691 0.29

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220119940-A1 PROCESS FOR THIN FILM DEPOSITION THROUGH CONTROLLED FORMATION OF VAPOR PHASE TRANSIENT SPECIES GELEST TECHNOLOGIES, INC. 2022-04-21 US disclosed
US-11248291-B2 Process for thin film deposition through controlled formation of vapor phase transient species GELEST, INC. (US) 2022-02-15 US disclosed
US-20210140036-A1 PROCESS FOR THIN FILM DEPOSITION THROUGH CONTROLLED FORMATION OF VAPOR PHASE TRANSIENT SPECIES GELEST, INC. 2021-05-13 US disclosed