SCHEMBL233460

SCHEMBL233460

CCC1(CO)COC(C(C)(C)CO)OC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15856915 0.92 EPHX1 (0.32) EPHX1
SCHEMBL4383381 0.90 EPHX1 (0.33) EPHX1
Methacrylic Acid SCHEMBL5277598 0.87
SCHEMBL1993294 0.86
SCHEMBL4812850 0.85 EPHX1 (0.32) EPHX1
SCHEMBL10933455 0.83 EPHX1 (0.31) EPHX1
SCHEMBL17219112 0.83
SCHEMBL14329488 0.82
SCHEMBL15088223 0.82
SCHEMBL13469000 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4640737-A1 POLYESTER RESIN, RESIN COMPOSITION FOR COSMETIC CONTAINER, MOLDED ARTICLE, AND COSMETIC CONTAINER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-10-29 EP claimed
US-20240218111-A1 EPOXY RESIN WITH IMPROVED WATER RESISTANCE AND COMPOSITION COMPRISING SAME SAMYANG CORPORATION (KR) 2024-07-04 US claimed
WO-2024135265-A1 POLYESTER RESIN, RESIN COMPOSITION FOR COSMETIC CONTAINER, MOLDED ARTICLE, AND COSMETIC CONTAINER 三菱瓦斯化学株式会社 2024-06-27 WO claimed
EP-4332141-A1 EPOXY RESIN WITH IMPROVED WATER RESISTANCE AND COMPOSITION COMPRISING SAME Samyang Corporation (KR) 2024-03-06 EP claimed
WO-2022231233-A1 EPOXY RESIN WITH IMPROVED WATER RESISTANCE AND COMPOSITION COMPRISING SAME 주식회사 삼양사 2022-11-03 WO claimed
EP-3354720-B1 USE OF A SUBSTRATE FOR CELL CULTURE, CELL CULTURE METHOD USING SAME AND CELL CULTURE VESSEL MITSUBISHI GAS CHEMICAL CO (JP) 2021-12-15 EP claimed
CN-109071928-B Polyester resin composition 三菱瓦斯化学株式会社 2021-07-13 CN claimed
CN-108779236-B Polyester resin 三菱瓦斯化学株式会社 2021-04-16 CN claimed
EP-3031607-B1 MULTILAYER MOLDING MITSUBISHI GAS CHEMICAL CO (JP) 2021-04-07 EP claimed
EP-3456782-B1 POLYESTER RESIN COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-12-02 EP claimed
US-20040028804-A1 Production of polymeric microarrays MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2004-02-12 US claimed
US-6653440-B2 Reacting dicarboxylic acid and/or an ester-forming derivative thereof with sublimable diol and non-sublimable diol MITSUBISHI GAS CHEMICAL COMPANY (JP) 2003-11-25 US claimed
US-20030195303-A1 Polyester resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-10-16 US claimed
EP-1321491-A1 Polyester resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-25 EP claimed
US-20030100702-A1 Process for producing copolyester resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-05-29 US claimed
EP-1310516-A1 Process for producing copolyester resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-05-14 EP claimed
EP-0207188-B1 Resin composition for solder resist ink DAINIPPON INK & CHEMICALS (JP) 1996-06-19 EP claimed
US-4888269-A EPOXY VINYL ESTER RESIN, PHOTOPOLYMERIZATION INHITIATOR, AMINE CURING AGENT DAINIPPON INK & CHEMICALS, INC. (JP) 1989-12-19 US claimed
US-4812489-A URETHANE ACRYLATE OLIGOMER, TRIS(2-HYDROXYETHYL)ISOCYANURATE TRIACRYLATE, REACTIVE DILUENT, AND A PHOTOPOLYMERIZATION INIATOR; CLADDING, BUFFER MATERIALS FOR OPTICAL FIBER UNITS THE YOKOHAMA RUBBER CO., LTD. (JP) 1989-03-14 US claimed
EP-0207188-A2 Resin composition for solder resist ink DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-01-07 EP claimed