SCHEMBL234201

SCHEMBL234201

CCCC[Si](CCCC)(NCC)NCC

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.41
ALDH1A1 P00352 1/20 0.36
ADH1B P00325 2/20 0.36
ADH1C P00326 2/20 0.36
ADH1A P07327 2/20 0.36
ADH7 P40394 2/20 0.36
EPHX1 P07099 1/20 0.35
ADH4 P08319 1/20 0.35
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.32
TP53 P04637 1/20 0.32
FAAH O00519 1/20 0.31
MEN1 O00255 1/20 0.30
GLA P06280 1/20 0.30
CYP2C19 P33261 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101688 0.95 TSHR (0.38) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL2101198 0.89 TSHR (0.38) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL722659 0.81 TP53 (0.35) TSHRADH1BADH1AADH7TP53
SCHEMBL234646 0.80 TSHR (0.41) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL234442 0.77 TSHR (0.35) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL2273160 0.77 TSHR (0.35) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL2101189 0.74 TSHR (0.33) TSHRLMNATHRBFAAH
SCHEMBL2269332 0.74 TSHR (0.33) TSHRLMNATHRBFAAH
SCHEMBL236457 0.73 TSHR (0.38) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL2099522 0.72 TSHR (0.32) TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US claimed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP claimed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO claimed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US claimed
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US disclosed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP disclosed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US disclosed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO disclosed
EP-2360190-B1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO LTD (JP) 2015-10-14 EP disclosed
US-8648001-B2 Aminosilane compounds, catalyst components and catalysts for olefin polymerization, and process for production of olefin polymers with the same TOHO TITANIUM CO., LTD. (JP) 2014-02-11 US disclosed
US-8426537-B2 Solid catalyst component and catalyst for polymerization of olefins, and process for production of olefin polymers using same TOHO TITANIUM CO., LTD. (JP) 2013-04-23 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20120053310-A1 Aminosilane Compounds, Catalyst Components and Catalysts for Olefin Polymerization, and Process for Production of Olefin Polymers with the Same TOHO TITANIUM CO., LTD. (JP) 2012-03-01 US disclosed
US-20120004378-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO., LTD (JP) 2012-01-05 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-2360190-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME Toho Titanium CO., LTD. (JP) 2011-08-24 EP disclosed
US-20100190942-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME TOHO CATALYST CO., LTD. (JP) 2010-07-29 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
EP-1908767-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME Toho Catalyst Co., Ltd. (JP) 2008-04-09 EP disclosed