SCHEMBL234207

SCHEMBL234207

CC(C)COCCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3239005 0.92 CYP3A4 (0.44)
SCHEMBL26123678 0.90 HTT (0.44)
SCHEMBL18819974 0.90 HTT (0.44)
SCHEMBL3244476 0.83
SCHEMBL3962044 0.83 SPHK1 (0.38)
SCHEMBL11858528 0.83 SPHK1 (0.42)
SCHEMBL24978972 0.83 CA12 (0.46)
SCHEMBL635567 0.81 CYP3A4 (0.44)
SCHEMBL13169200 0.81 CYP3A4 (0.44)
SCHEMBL31086433 0.80 SPHK1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 368 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116103067-B Alkoxypropylamine compound and application thereof in organic sulfur absorption and removal 华东理工大学 2025-03-18 CN claimed
CN-116103067-A Alkoxypropylamine compound and application thereof in organic sulfur absorption and removal 华东理工大学 2023-05-12 CN claimed
US-11198090-B2 Method for regenerating an amine-based, acid gas absorbent using a catalyst mixture containing silver oxide and silver carbonbate KOREA INSTITUTE OF ENERGY RESEARCH (KR) 2021-12-14 US claimed
US-20200330920-A1 METHOD FOR REGENERATION OF ACID GAS ABSORBENTS USING MIXED CATALYST OF SILVER OXIDE AND SILVER CARBONATE KOREA INSTITUTE OF ENERGY RESEARCH (KR) 2020-10-22 US claimed
WO-2020071596-A1 METHOD FOR REGENERATING ACID GAS ABSORBER BY USING CATALYTIC MIXTURE OF SILVER OXIDE AND SILVER CARBONATE 한국에너지기술연구원 2020-04-09 WO claimed
US-10067266-B2 Method of producing resin for thiourethane-based optical material using general-purpose polyisocyanate compound, resin composition for thiourethane-based optical material and thiourethane-based optical material including resin produced by the method KOC SOLUTION CO., LTD. (KR) 2018-09-04 US claimed
EP-2682430-B1 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2015-10-21 EP claimed
CN-103108918-B Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2015-07-15 CN claimed
US-20140039145-A1 METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD KOC SOLUTION CO LTD (KR) 2014-02-06 US claimed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP claimed
CN-103108918-A Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2013-05-15 CN claimed
US-6723836-B1 REACTING POLYOL WITH A PRIMARY AMINE TO REDUCE THE ALDEHYDE ODOR THE YOKOHAMA RUBBER CO., LTD. (JP) 2004-04-20 US claimed
EP-0400657-B1 Process for developing of ps plates requiring no dampening water FUJI PHOTO FILM CO LTD (JP) 1996-03-27 EP claimed
US-5290665-A Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-03-01 US claimed
US-5230989-A Presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US claimed
EP-0400657-A2 Process for developing of ps plates requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-12-05 EP claimed
JP-63201657-A None JP disclosed
US-20260084971-A1 COLLOIDAL SILICA AND METHOD FOR PRODUCING SAME FUSO CHEMICAL CO., LTD. (JP) 2026-03-26 US disclosed
US-4045424-A Salt of a sulfonic acid substituted 1:2 metal complex dye with a basic dye and an amine BASF AKTIENGESELLSCHAFT (DT) 1977-08-30 US disclosed
US-4027037-A ARTHROPOD METAMORPHOSIS INHIBITORS BAYER AKTIENGESELLSCHAFT (DT) 1977-05-31 US disclosed