SCHEMBL23501484

SCHEMBL23501484

CCNC(C)NCC(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40
PTGS2 P35354 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
ECE1 P42892 1/20 0.39
MME P08473 1/20 0.38
ACE P12821 1/20 0.38
CPA1 P15085 1/20 0.38
ACE2 Q9BYF1 1/20 0.38
FFAR3 O14843 2/20 0.35
EGLN1 Q9GZT9 2/20 0.33
CTH P32929 1/20 0.33
CYP2D6 P10635 2/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CYP2C19 P33261 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5682012 0.76
SCHEMBL29222968 0.76 GABRR1 (0.40) ALDH1A1LMNAMAPTPTGS2TDP1
SCHEMBL183328 0.76 EPHX1 (0.44) ALDH1A1TDP1PLA2G2A
SCHEMBL28038929 0.76 EPHX1 (0.44) ALDH1A1TDP1PLA2G2A
SCHEMBL3423900 0.76 EPHX1 (0.44) ALDH1A1TDP1PLA2G2A
SCHEMBL27602335 0.76 EPHX1 (0.44) ALDH1A1TDP1PLA2G2A
SCHEMBL2063176 0.76
SCHEMBL610051 0.74 EPHX1 (0.43) ALDH1A1TDP1PLA2G2A
Hydrochloric Acid SCHEMBL4238000 0.74 EPHX1 (0.43) ALDH1A1TDP1PLA2G2A
Hydrochloric Acid SCHEMBL6693549 0.74 EPHX1 (0.43) ALDH1A1TDP1PLA2G2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024048271-A1 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD JSR株式会社 2024-03-07 WO disclosed
WO-2023026813-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION, AND POLISHING METHOD JSR株式会社 2023-03-02 WO disclosed
WO-2023026814-A1 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD JSR株式会社 2023-03-02 WO disclosed
WO-2023026778-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD JSR株式会社 2023-03-02 WO disclosed
WO-2023026780-A1 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD JSR株式会社 2023-03-02 WO disclosed
WO-2023026779-A1 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD JSR株式会社 2023-03-02 WO disclosed
WO-2021117428-A1 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR POLISHING JSR株式会社 2021-06-17 WO disclosed