⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2269599 | 0.69 | — | — | |
| SCHEMBL235984 | 0.69 | — | — | |
| SCHEMBL26255357 | 0.67 | — | — | |
| SCHEMBL2267471 | 0.67 | — | — | |
| SCHEMBL2101869 | 0.67 | — | — | |
| SCHEMBL2100220 | 0.65 | — | — | |
| SCHEMBL2099540 | 0.65 | — | — | |
| SCHEMBL2102783 | 0.65 | — | — | |
| SCHEMBL8745483 | 0.65 | — | — | |
| SCHEMBL233275 | 0.62 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12584212-B2 | Compositions and methods using same for germanium seed layer | VERSUM MATERIALS US, LLC (US) | 2026-03-24 | — | — | US | claimed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | claimed |
| EP-4176100-A1 | COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER | Versum Materials US, LLC (US) | 2023-05-10 | — | — | EP | claimed |
| WO-2022020705-A1 | COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC (US) | 2022-01-27 | — | — | WO | claimed |
| US-9245739-B2 | Low-K oxide deposition by hydrolysis and condensation | LAM RESEARCH CORPORATION (US) | 2016-01-26 | — | — | US | claimed |
| US-20150004806-A1 | LOW-K OXIDE DEPOSITION BY HYDROLYSIS AND CONDENSATION | LAM RESEARCH CORPORATION | 2015-01-01 | — | — | US | claimed |
| US-12584212-B2 | Compositions and methods using same for germanium seed layer | VERSUM MATERIALS US, LLC (US) | 2026-03-24 | — | — | US | disclosed |
| US-20250188615-A1 | Gapfill Methods and Processing Assemblies | ASM IP HOLDING B.V. (NL) | 2025-06-12 | — | — | US | disclosed |
| US-12252790-B2 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2025-03-18 | — | — | US | disclosed |
| US-20240117494-A1 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2024-04-11 | — | — | US | disclosed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | disclosed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | disclosed |
| US-9245739-B2 | Low-K oxide deposition by hydrolysis and condensation | LAM RESEARCH CORPORATION (US) | 2016-01-26 | — | — | US | disclosed |
| US-20120053310-A1 | Aminosilane Compounds, Catalyst Components and Catalysts for Olefin Polymerization, and Process for Production of Olefin Polymers with the Same | TOHO TITANIUM CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120004378-A1 | SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME | TOHO TITANIUM CO., LTD (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-2360190-A1 | SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME | Toho Titanium CO., LTD. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20100190942-A1 | AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME | TOHO CATALYST CO., LTD. (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-1908767-A1 | AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME | Toho Catalyst Co., Ltd. (JP) | 2008-04-09 | — | — | EP | disclosed |