SCHEMBL2355448

SCHEMBL2355448

CO[Si](OC)(OC)C(C)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
SLC1A3 P43003 1/20 0.32
SLC1A2 P43004 1/20 0.32
SLC1A1 P43005 1/20 0.32
SLC7A5 Q01650 1/20 0.32
LDHA P00338 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27877428 0.89 TP53 (0.31) TP53
SCHEMBL28447376 0.78 TP53 (0.38) TP53SLC1A3SLC1A2SLC1A1SLC7A5
SCHEMBL28447355 0.76 TP53 (0.36) TP53SLC1A3SLC1A2SLC1A1SLC7A5
SCHEMBL3376145 0.76
SCHEMBL121148 0.76 SMN1; SMN2 (0.42)
SCHEMBL23413739 0.75
SCHEMBL28222460 0.74 TP53 (0.33) TP53SLC1A3SLC1A2SLC1A1
SCHEMBL451424 0.73
SCHEMBL3376148 0.72
SCHEMBL745932 0.72 TP53 (0.33) TP53SLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117970747-A Photoresist for optical wire bonding and preparation method thereof 武汉光电工业技术研究院有限公司 2024-05-03 CN claimed
CN-114265284-A High-heat-resistance copolymerization type negative photoresist composition and preparation method thereof 深圳迪道微电子科技有限公司 2022-04-01 CN claimed
US-9403128-B2 Nanoengineered field induced charge separation membranes manufacture thereof LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2016-08-02 US claimed
US-20140166489-A1 NANOENGINEERED FIELD INDUCED CHARGE SEPARATION MEMBRANES MANUFACTURE THEREOF LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2014-06-19 US claimed
EP-0545702-B1 2-Trimethoxysilylpropionate SHINETSU CHEMICAL CO (JP) 1997-05-14 EP claimed
US-5286892-A 2-trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-02-15 US claimed
EP-0545702-A1 2-Trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-06-09 EP claimed
CN-119253196-A Modified diaphragm, preparation method and lithium metal battery 深圳市豪鹏科技股份有限公司 2025-01-03 CN disclosed
CN-114265284-B High heat-resistant copolymerization type negative photoresist composition and preparation method thereof 深圳迪道微电子科技有限公司 2024-11-08 CN disclosed
US-20240307867-A1 FIBER ARRAYS EARLY IS GOOD, INC. 2024-09-19 US disclosed
CN-108333869-B Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element JSR株式会社 2023-07-18 CN disclosed
CN-116390997-A Nanocrystalline-containing composition, ink composition, light conversion layer, and light-emitting element DIC株式会社 2023-07-04 CN disclosed
CN-115968394-A Ink composition containing luminescent particles, light conversion layer and light-emitting element DIC株式会社 2023-04-14 CN disclosed
US-5286892-A 2-trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-02-15 US disclosed
US-5286892-A 2-trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-02-15 US disclosed
EP-0545702-A1 2-Trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-06-09 EP disclosed
EP-0545702-A1 2-Trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-06-09 EP disclosed
EP-0545702-A1 2-Trimethoxysilylpropionate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-06-09 EP disclosed
US-4963356-A Stable antigenic extracts methods MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-10-16 US disclosed
US-4280992-A Immunologically active substance-glass conjugates, process for producing the same and diagnostic reagents containing the same SANYO CHEMICAL INDUSTRIES, LTD. (JP) 1981-07-28 US disclosed