⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18232601 | 1.00 | — | — | |
| SCHEMBL18235968 | 0.92 | — | — | |
| SCHEMBL26063326 | 0.87 | — | — | |
| SCHEMBL18232582 | 0.86 | — | — | |
| SCHEMBL18232614 | 0.85 | — | — | |
| SCHEMBL23351364 | 0.85 | — | — | |
| SCHEMBL26475718 | 0.85 | — | — | |
| SCHEMBL24268479 | 0.85 | — | — | |
| SCHEMBL18232575 | 0.85 | — | — | |
| SCHEMBL12912779 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20210200083-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |