⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16384388 | 0.97 | CA12 (0.48) | — | |
| Ammonia Solution, Strong SCHEMBL28832389 | 0.97 | CA12 (0.43) | — | |
| SCHEMBL16298585 | 0.89 | CA12 (0.38) | — | |
| SCHEMBL15091 | 0.87 | CA12 (0.52) | — | |
| SCHEMBL26447226 | 0.85 | CA12 (0.52) | — | |
| SCHEMBL12918862 | 0.84 | CA12 (0.56) | — | |
| Ammonia Solution, Strong SCHEMBL10349483 | 0.84 | CA12 (0.50) | — | |
| SCHEMBL3973874 | 0.84 | CA12 (0.56) | — | |
| Water SCHEMBL2217898 | 0.84 | CA12 (0.50) | — | |
| Hydrochloric Acid SCHEMBL473385 | 0.84 | CA12 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8298744-B2 | Coating material for photoresist pattern and method of forming fine pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-30 | — | — | US | claimed |
| US-20080286684-A1 | COATING MATERIAL FOR PHOTORESIST PATTERN AND METHOD OF FORMING FINE PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-20 | — | — | US | claimed |
| CN-118215472-A | Lipid nanoparticles for oligonucleotide delivery | 纪费亚斯公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-118215471-A | Lipid nanoparticles for oligonucleotide delivery | 纪费亚斯公司 | 2024-06-18 | — | — | CN | disclosed |
| WO-2023115203-A1 | OXER1 ANTAGONISTS AND USES THEREOF | FAIRHAVEN PHARMACEUTICALS INC. (CA) | 2023-06-29 | — | — | WO | disclosed |
| US-20230150997-A1 | EIF4E INHIBITORS AND USES THEREOF | PIC Therapeutics, Inc. | 2023-05-18 | — | — | US | disclosed |
| US-20230131260-A1 | SUBSTITUTED THIOPHENYL URACILS, SALTS THEREOF AND THE USE THEREOF AS HERBICIDAL AGENTS | SYNGENTA CROP PROTECTION AG (CH) | 2023-04-27 | — | — | US | disclosed |
| WO-2021262731-A2 | MACROCYCLIC COMPOUNDS AND METHODS OF USE THEREOF | GENENTECH, INC. (US) | 2021-12-30 | — | — | WO | disclosed |
| EP-3897839-A1 | IMIDAZOPYRAZINE DERIVATIVES AS ANTIBACTERIAL AGENTS | F. Hoffmann-La Roche AG (CH) | 2021-10-27 | — | — | EP | disclosed |
| EP-3898629-A1 | IMIDAZOPYRAZINE DERIVATIVES AS ANTIBACTERIALS | F. Hoffmann-La Roche AG (CH) | 2021-10-27 | — | — | EP | disclosed |
| EP-3897840-A1 | IMIDAZOPYRAZINE DERIVATIVES AS ANTIBACTERIAL AGENTS | F. Hoffmann-La Roche AG (CH) | 2021-10-27 | — | — | EP | disclosed |
| WO-2009007540-A1 | LITHIUM-ION BATTERY CONTAINING AN ELECTROLYTE THAT COMPRISES AN IONIC LIQUID | SAFT GROUPE SA (FR) | 2009-01-15 | — | — | WO | disclosed |
| US-20080286684-A1 | COATING MATERIAL FOR PHOTORESIST PATTERN AND METHOD OF FORMING FINE PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-11-20 | — | — | US | disclosed |
| EP-1421094-B1 | 4\"-DEOXY-4\"-(S)-AMINO AVERMECTIN DERIVATIVES | MERIAL LTD (GB) | 2008-10-15 | — | — | EP | disclosed |
| EP-1520849-A1 | Process for the preparation of 2-(n,n-dialkylamino)-ethoxy compounds | Degussa AG (DE) | 2005-04-06 | — | — | EP | disclosed |
| EP-1453869-A2 | MICROSTRUCTURE MODIFIER FOR ANIONIC POLYMERIZATION | Hellermann, Walter (DE) | 2004-09-08 | — | — | EP | disclosed |
| WO-2003044065-A2 | MICROSTRUCTURE MODIFIER FOR ANIONIC POLYMERIZATION | HELLERMANN WALTER (DE) | 2003-05-30 | — | — | WO | disclosed |
| EP-0518013-A2 | Process for the preparation of 1-alkoxy-2-dialkylaminoethanes | HÜLS AKTIENGESELLSCHAFT (DE) | 1992-12-16 | — | — | EP | disclosed |
| EP-0014745-B1 | CURING AGENT FOR POLYEPOXIDES, CURABLE EPOXY RESIN COMPOSITIONS, HARDENED PRODUCTS THEREFROM AND PROCESS FOR CURING A POLYEPOXIDE | DIAMOND SHAMROCK CORPORATION (US) | 1983-05-25 | — | — | EP | disclosed |
| EP-0014745-A1 | Curing agent for polyepoxides, curable epoxy resin compositions, hardened products therefrom and process for curing a polyepoxide | DIAMOND SHAMROCK CORPORATION (US) | 1980-09-03 | — | — | EP | disclosed |