⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21799209 | 0.83 | — | — | |
| SCHEMBL23532432 | 0.82 | — | — | |
| SCHEMBL34977 | 0.82 | — | — | |
| SCHEMBL8460473 | 0.80 | — | — | |
| SCHEMBL29059587 | 0.78 | — | — | |
| SCHEMBL10879594 | 0.78 | — | — | |
| SCHEMBL3943980 | 0.78 | — | — | |
| SCHEMBL31382822 | 0.78 | — | — | |
| SCHEMBL8418475 | 0.78 | — | — | |
| SCHEMBL28227398 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1970421-B1 | COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID | JGC CATALYSTS & CHEMICALS LTD (JP) | 2015-04-29 | — | — | EP | disclosed |
| US-7989033-B2 | Silicon precursors to make ultra low-K films with high mechanical properties by plasma enhanced chemical vapor deposition | APPLIED MATERIALS, INC. (US) | 2011-08-02 | — | — | US | disclosed |
| WO-2010014626-A2 | NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2010-02-04 | — | — | WO | disclosed |
| US-20090025609-A1 | Coating Liquid for Forming Low Dielectric Constant Amorphous Silica-Based Coating Film and the Coating Film Obtained From the Same | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090017231-A1 | NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. | 2009-01-15 | — | — | US | disclosed |
| EP-1970421-A1 | COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID | CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) | 2008-09-17 | — | — | EP | disclosed |
| CN-1809764-A | Antireflective film | ASAHI CHEMICAL IND (JP) | 2006-07-26 | — | — | CN | disclosed |