Anisole

Anisole

SCHEMBL2363591

CCC(C)=O.COc1ccccc1

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.61
CES2 O00748 1/20 0.53
CES1 P23141 1/20 0.53
LTA4H P09960 2/20 0.52
RAB9A P51151 4/20 0.49
NPC1 O15118 3/20 0.49
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
LMNA P02545 1/20 0.47
NR1I2 O75469 1/20 0.47
ALDH1A1 P00352 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
MAPT P10636 2/20 0.46
MEN1 O00255 1/20 0.46
CYP1A2 P05177 1/20 0.46
CYP3A4 P08684 1/20 0.46
CYP2D6 P10635 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
KMT2A Q03164 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anisole SCHEMBL27608743 0.98 CA4 (0.58) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL7429921 0.89 CA4 (0.64) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL27466140 0.87 CA4 (0.61) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL3008918 0.86 CA4 (0.74) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL28307620 0.86 CA4 (0.74) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL30068922 0.86 CA4 (0.74) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL5696157 0.86 CA4 (0.74) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL27648635 0.85 CA4 (0.58) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL28111548 0.85 CA4 (0.58) CA4CES2CES1LTA4HRAB9A
Anisole SCHEMBL9696388 0.84 CA4 (0.70) CA4CES2CES1LTA4HRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109731759-A A kind of colored precoating plate with high gloss 江苏立霸实业股份有限公司 2019-05-10 CN claimed
CN-108707079-A The synthesis technology of dobutamine hydrochloride 浙江瑞新药业股份有限公司 2018-10-26 CN claimed
CN-104693162-B A kind of method of synthesis β ester group gamma butyrolactone 大连大学 2017-03-08 CN claimed
CN-104860833-A Purification method of dobutamine hydrochloride Shanghai ziyuan pharmaceutical co ltd 2015-08-26 CN claimed
CN-113490659-B Improved and economically viable process for preparing aryl ketones 安西娅芳香剂私人有限公司 2024-03-29 CN disclosed
CN-113912556-A Synthetic method of alpha, beta-dicarbonyl-1, 2, 3-triazole compound 武汉工程大学 2022-01-11 CN disclosed
CN-110423429-A A kind of high-efficiency abrasion-proof brush roll material and preparation method thereof ANHUI HENGCHANG BRUSH MAKING CO LTD 2019-11-08 CN disclosed
CN-109731759-A A kind of colored precoating plate with high gloss 江苏立霸实业股份有限公司 2019-05-10 CN disclosed
CN-108707079-A The synthesis technology of dobutamine hydrochloride 浙江瑞新药业股份有限公司 2018-10-26 CN disclosed
CN-105906515-B A kind of dobutamine hydrochloride decoloration process 菏泽市方明制药有限公司 2018-03-13 CN disclosed
CN-107006530-A A kind of attractant for juxiaoshi fly 四川科劲生物科技有限公司 2017-08-04 CN disclosed
CN-105906515-A Dobutamine hydrochloride decoloration technology 菏泽市方明制药有限公司 2016-08-31 CN disclosed
WO-2007064678-A1 HIGH GLASS TRANSITION TEMPERATURE COPOLYCARBONATES, METHODS OF MANUFACTURE, AND USES THEREOF GENERAL ELECTRIC COMPANY (US) 2007-06-07 WO disclosed
WO-2007064574-A1 COPOLYCARBONATE-POLYESTERS, METHODS OF MANUFACTURE, AND USES THEREOF GENERAL ELECTRIC COMPANY (US) 2007-06-07 WO disclosed
US-20070123687-A1 Copolycarbonate-polyesters, methods of manufacture, and uses thereof SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2007-05-31 US disclosed
US-20070123688-A1 High glass transition temperature copolycarbonates, methods of manufacture, and uses thereof SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2007-05-31 US disclosed
CN-1930140-A Trisubstituted furans suitable for the preparation of fragrance compositions GIVAUDAN SA (CH) 2007-03-14 CN disclosed
EP-0254853-B1 Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network IBM (US) 1995-01-04 EP disclosed
US-4939070-A Thermally stable photoresists with high sensitivity BRUNSVOLD WILLIAM R (US) 1990-07-03 US disclosed
EP-0254853-A2 Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network International Business Machines Corporation (US) 1988-02-03 EP disclosed