SCHEMBL23640700

SCHEMBL23640700

C=C(COC)C(=O)OC12CC(OC1=O)C1OC(C)(C)OC1C2

nearest known ligand 0.30

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ MGAM O43451 1/20 0.30
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30
▸ GAA P10253 1/20 0.30
▸ SI P14410 1/20 0.30
▸ ACHE P22303 1/20 0.30
▸ MGAM2 Q2M2H8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17466776 0.79 MGAM (0.34) MGAMCA1CA2GAASI
SCHEMBL10063783 0.79 MGAM (0.35) MGAMCA1CA2GAASI
SCHEMBL13825710 0.77 MGAM (0.33) MGAMCA1CA2GAASI
SCHEMBL12511006 0.77 MGAM (0.33) MGAMCA1CA2GAASI
SCHEMBL12510958 0.77 MGAM (0.33) MGAMCA1CA2GAASI
SCHEMBL10099996 0.77 MGAM (0.33) MGAMCA1CA2GAASI
SCHEMBL13825725 0.77 MGAM (0.33) MGAMCA1CA2GAASI
SCHEMBL10099994 0.77 MGAM (0.31) MGAMCA1CA2GAASI
SCHEMBL25468150 0.72 — —
SCHEMBL15481364 0.69 CA1 (0.33) MGAMCA1CA2GAASI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021140909-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2021-07-15 — — WO disclosed
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