Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23640365 | 0.89 | POLB (0.46) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL328665 | 0.83 | MAPK1 (0.47) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL12914688 | 0.81 | MAPK1 (0.45) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL23474831 | 0.80 | MAPK1 (0.38) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL17550596 | 0.79 | POLB (0.49) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL16372900 | 0.77 | MAPK1 (0.41) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL14878904 | 0.76 | MAPK1 (0.50) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL12165405 | 0.76 | KDM4E (0.46) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL685643 | 0.74 | MAPK1 (0.45) | POLBMAPK1CYP1A2CYP2C9CYP2C19 | |
| SCHEMBL12705372 | 0.74 | MAPK1 (0.45) | POLBMAPK1CYP1A2CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021140909-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-07-15 | — | — | WO | disclosed |