⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29000955 | 0.77 | — | — | |
| SCHEMBL31261123 | 0.77 | KDM4E (0.30) | — | |
| SCHEMBL19379856 | 0.77 | GRM4 (0.33) | — | |
| SCHEMBL713734 | 0.77 | GRM4 (0.30) | — | |
| SCHEMBL1982478 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL4989395 | 0.73 | — | — | |
| SCHEMBL28354522 | 0.72 | — | — | |
| SCHEMBL29007685 | 0.70 | HDAC4 (0.32) | — | |
| SCHEMBL8125370 | 0.69 | CHRM3 (0.33) | — | |
| SCHEMBL7909936 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12321097-B2 | Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper | ECHEM SOLUTIONS CORP. (TW) | 2025-06-03 | — | — | US | disclosed |
| CN-113219796-B | Removing method, laminated body, forming method and polyimide resin | 新应材股份有限公司 | 2025-01-10 | — | — | CN | disclosed |
| CN-113219796-A | Removing method, laminate, forming method, polyimide resin, and stripping liquid | 新应材股份有限公司 | 2021-08-06 | — | — | CN | disclosed |
| US-20210223699-A1 | METHOD OF REMOVING PHOTORESIST, LAMINATE, METHOD OF FORMING METALLIC PATTERN, POLYIMIDE RESIN AND STRIPPER | ECHEM SOLUTIONS CORP. (TW) | 2021-07-22 | — | — | US | disclosed |