⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1587325 | 0.67 | — | — | |
| SCHEMBL47748 | 0.61 | — | — | |
| SCHEMBL1529158 | 0.58 | — | — | |
| SCHEMBL12886601 | 0.58 | — | — | |
| SCHEMBL12055953 | 0.55 | — | — | |
| SCHEMBL23646180 | 0.55 | — | — | |
| SCHEMBL18843284 | 0.50 | — | — | |
| SCHEMBL9683812 | 0.50 | — | — | |
| SCHEMBL12134779 | 0.50 | — | — | |
| SCHEMBL29070159 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11784026-B2 | Substrate processing apparatus, material layer deposition apparatus, and atmospheric pressure chemical vapor deposition apparatus | SAMSUNG ELECTRONICS CO., LTD. | 2023-10-10 | — | — | US | disclosed |
| US-11770974-B2 | P active materials for organic photoelectric conversion layers in organic photodiodes | SONY CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20210222300-A1 | SUBSTRATE PROCESSING APPARATUS, MATERIAL LAYER DEPOSITION APPARATUS, AND ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-07-22 | — | — | US | disclosed |
| CN-107068537-A | The method of material layer including its semiconductor devices and manufacture material layer and semiconductor devices | 三星电子株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-102770409-B | Process for production of cyclopropanecarboxylic acid ester compound | SUMITOMO CHEMICAL CO | 2015-07-15 | — | — | CN | disclosed |