⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8836112 | 0.86 | — | — | |
| SCHEMBL3296062 | 0.83 | — | — | |
| SCHEMBL8769494 | 0.83 | — | — | |
| SCHEMBL22611914 | 0.81 | — | — | |
| SCHEMBL986710 | 0.81 | — | — | |
| SCHEMBL5179977 | 0.81 | — | — | |
| SCHEMBL8969860 | 0.81 | — | — | |
| SCHEMBL28158257 | 0.81 | — | — | |
| SCHEMBL28205253 | 0.79 | — | — | |
| SCHEMBL23813396 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1475 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146159-A1 | Random Copolymer | HighRI Optics, Inc. (US) | 2026-05-28 | — | — | US | claimed |
| US-12497472-B2 | Long-chain branched ethylene-based polymers | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-12-16 | — | — | US | claimed |
| US-12479937-B2 | Process for producing long-chain branched ethylene-based polymers | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-11-25 | — | — | US | claimed |
| EP-4026817-B1 | POLYMER-DERIVED CERAMIC MATERIALS | HRL LAB LLC (US) | 2025-10-08 | — | — | EP | claimed |
| US-12331164-B2 | Curable siloxane resin composition | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-06-17 | — | — | US | claimed |
| CN-118993619-B | Anti-icing asphalt pavement and preparation method thereof | 广州城市职业学院 | 2025-05-27 | — | — | CN | claimed |
| CN-119591803-A | High-adaptability polycarboxylate superplasticizer and preparation method thereof | 科之杰新材料集团有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-115397875-B | Process for producing long chain branched ethylene-based polymers | 陶氏环球技术有限责任公司 | 2025-03-11 | — | — | CN | claimed |
| WO-2025049301-A1 | POLYMER BLENDS INCLUDING POST-CONSUMER RECYCLED (PCR) ETHYLENE-BASED POLYMERS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-03-06 | — | — | WO | claimed |
| WO-2025049300-A1 | POLYMER BLENDS COMPRISING TRIMODAL ETHYLENE-BASED POLYMERS AND PCR | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-03-06 | — | — | WO | claimed |
| US-6646089-B2 | Having a plurality of each of at least two different types of functional groups, such as vinyl or allyl groups and hydrolyzable groups | MICHIGAN MOLECULAR INSTITUTE | 2003-11-11 | — | — | US | claimed |
| US-20030088024-A1 | Having a plurality of each of at least two different types of functional groups, such as vinyl or allyl groups and hydrolyzable groups | 3M INNOVATIVE PROPERTIES COMPANY | 2003-05-08 | — | — | US | claimed |
| EP-1300434-A2 | Hyperbranched polymers with latent functionality and methods of making same | Michigan Molecular Institute (US) | 2003-04-09 | — | — | EP | claimed |
| US-6436824-B1 | Low dielectric constant materials for copper damascene | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2002-08-20 | — | — | US | claimed |
| US-20020107426-A1 | Process for the preparation of mono-, bi- or poly- functional biaryls | UMICORE AG & CO. KG (DE) | 2002-08-08 | — | — | US | claimed |
| EP-1199292-A1 | Process for the production of mono-, bi- or polyfunctional biaryls | OMG AG & Co. KG (DE) | 2002-04-24 | — | — | EP | claimed |
| US-6136874-A | Microporous polymeric foams made with silicon or germanium based monomers | THE PROCTER & GAMBLE COMPANY (US) | 2000-10-24 | — | — | US | claimed |
| WO-1991009065-A1 | STEREOREGULAR CYCLO-OLEFINIC POLYMERS AND METHOD | THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) | 1991-06-27 | — | — | WO | claimed |
| US-4693927-A | MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT | FUJI PHOTO FILM COMPANY LIMITED (JP) | 1987-09-15 | — | — | US | claimed |
| US-4560641-A | PLASMA POLYMERIZATION, PATTERNWISE EXPOSURE, AND DEVELOPMENT | HITACHI, LTD. (JP) | 1985-12-24 | — | — | US | claimed |