⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12558778 | 0.88 | — | — | |
| SCHEMBL11363190 | 0.83 | — | — | |
| SCHEMBL4849732 | 0.77 | — | — | |
| SCHEMBL4849729 | 0.77 | — | — | |
| SCHEMBL22167560 | 0.77 | — | — | |
| SCHEMBL7888431 | 0.75 | — | — | |
| SCHEMBL73306 | 0.72 | — | — | |
| SCHEMBL2769373 | 0.71 | — | — | |
| SCHEMBL11435831 | 0.71 | — | — | |
| SCHEMBL2769371 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115038810-B | Raw material for chemical vapor deposition comprising organic ruthenium compound and chemical vapor deposition method using same | 田中贵金属工业株式会社 | 2024-07-19 | — | — | CN | disclosed |
| US-11913110-B2 | Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11913110-B2 | Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2024-02-27 | — | — | US | disclosed |
| WO-2021153639-A1 | CHEMICAL VAPOR DEPOSITION RAW MATERIAL COMPRISING ORGANIC RUTHENIUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION RAW MATERIAL | 田中貴金属工業株式会社 | 2021-08-05 | — | — | WO | disclosed |