SCHEMBL2373729

SCHEMBL2373729

C=CN1CCCC(=O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15118 0.88
SCHEMBL8408343 0.78
SCHEMBL3431239 0.76
SCHEMBL383299 0.72
SCHEMBL6365325 0.72
SCHEMBL3427643 0.71 BRD4 (0.32)
SCHEMBL3426416 0.70
SCHEMBL8334582 0.70
SCHEMBL7211171 0.70 CYP3A4 (0.37)
SCHEMBL18957379 0.69 MAPK1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0418247-A1 LOW COEFFICIENT OF FRICTION SURFACE E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-03-27 EP claimed
WO-1989009246-A1 LOW COEFFICIENT OF FRICTION SURFACE E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-10-05 WO claimed
EP-3495341-B1 PREPARATION PROCESS OF PERFLUOROALKYL COMPOUND WITH MONOHYDROPERFLUOROALKANE AS STARTING MATERIAL KANTO DENKA KOGYO KK (JP) 2022-11-02 EP disclosed
US-10450253-B2 Preparation process of perfluoroalkyl compound with monohydroperfluoroalkane as starting material KANTO DENKA KOGYO CO., LTD. (JP) 2019-10-22 US disclosed
EP-3495341-A1 METHOD FOR PRODUCING PERFLUOROALKYL COMPOUND USING MONOHYDROPERFLUOROALKANE AS STARTING MATERIAL Kanto Denka Kogyo Co., Ltd. (JP) 2019-06-12 EP disclosed
US-20190169107-A1 PREPARATION PROCESS OF PERFLUOROALKYL COMPOUND WITH MONOHYDROPERFLUOROALKANE AS STARTING MATERIAL NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY (JP) 2019-06-06 US disclosed
CN-109563016-A Using single hydrogen perfluoro alkane as the manufacturing method of the all-fluoroalkyl compound of starting material 关东电化工业株式会社 2019-04-02 CN disclosed
EP-3436465-A1 MODIFIED IONIC LIQUIDS CONTAINING PHOSPHORUS Nohms Tehcnologies, Inc. (US) 2019-02-06 EP disclosed
WO-2017173323-A1 MODIFIED IONIC LIQUIDS CONTAINING PHOSPHORUS NOHMs Technologies, Inc. (US) 2017-10-05 WO disclosed
EP-1317013-B1 NON-AQUEOUS ELECTROLYTE AND SECONDARY CELL USING THE SAME MITSUBISHI CHEM CORP (JP) 2017-03-15 EP disclosed
US-8288496-B2 Contact lens and its manufacturing method NIPPON CONTACT LENS INC. (JP) 2012-10-16 US disclosed
US-20030165733-A1 Nonaqueous electrolyte solution and secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2003-09-04 US disclosed
US-6592953-B1 Receiving sheet for ink-jet printing comprising a copolymer FERRANIA, S.P.A. (IT) 2003-07-15 US disclosed
EP-1317013-A1 NON-AQUEOUS ELECTROLYTE AND SECONDARY CELL USING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2003-06-04 EP disclosed
EP-1101625-A2 Receiving sheet for ink-jet printing comprising a copolymer FERRANIA S.p.A. (IT) 2001-05-23 EP disclosed
US-5955606-A PHOTORESISTS OF POLYVINYLLACTAMS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1999-09-21 US disclosed
US-5750680-A BLOCKED AT 3-POSITION; FOR USE IN MICROLITHOGRAPHY OF SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1998-05-12 US disclosed
CN-1153775-A Novel N-vinyllactam derivatives and polymers thereof HYUNDAI ELECTRONICS IND (KR) 1997-07-09 CN disclosed
EP-0418247-A1 LOW COEFFICIENT OF FRICTION SURFACE E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-03-27 EP disclosed
WO-1989009246-A1 LOW COEFFICIENT OF FRICTION SURFACE E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-10-05 WO disclosed