⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2855280 | 0.93 | — | — | |
| SCHEMBL269960 | 0.81 | — | — | |
| Lithium SCHEMBL31098918 | 0.77 | — | — | |
| SCHEMBL7613366 | 0.73 | — | — | |
| SCHEMBL8820415 | 0.69 | — | — | |
| SCHEMBL6461586 | 0.68 | — | — | |
| SCHEMBL8038347 | 0.67 | — | — | |
| SCHEMBL58775 | 0.66 | — | — | |
| SCHEMBL8428628 | 0.66 | — | — | |
| SCHEMBL17225849 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4590766-A1 | PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING | National Research Council of Canada (CA) | 2025-07-30 | — | — | EP | claimed |
| US-20240250301-A1 | ELECTROLYTES FOR SILICON-CONTAINING ELECTRODES | GM Global Technology Operations LLC (US) | 2024-07-25 | — | — | US | claimed |
| CN-118352462-A | Electrolyte for silicon-containing electrode | 通用汽车环球科技运作有限责任公司 | 2024-07-16 | — | — | CN | claimed |
| US-20240110070-A1 | PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING | NATIONAL RESEARCH COUNCIL OF CANADA (CA) | 2024-04-04 | — | — | US | claimed |
| WO-2024059932-A1 | PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING | NATIONAL RESEARCH COUNCIL OF CANADA (CA) | 2024-03-28 | — | — | WO | claimed |
| CN-116135948-A | Chemical etching composition and application thereof | 安集微电子（上海）有限公司 | 2023-05-19 | — | — | CN | claimed |
| CN-115584263-A | Chemical etching composition and application thereof | 安集微电子（上海）有限公司 | 2023-01-10 | — | — | CN | claimed |
| EP-3782220-A1 | AN ELECTROLYTE COMPOSITION FOR A LITHIUM-ION BATTERY AND A LITHIUM-ION BATTERY | Karlsruher Institut für Technologie (DE) | 2021-02-24 | — | — | EP | claimed |
| WO-2016032246-A1 | LUBRICANT COMPOSITION FOR IMPROVING THERMO-OXIDATION STABILITY AND COLOR STABILITY | SK INNOVATION CO., LTD. (KR) | 2016-03-03 | — | — | WO | claimed |
| EP-0840366-A2 | Method of forming a phosphorus doped silica glass film | CANON SALES CO., INC. (JP) | 1998-05-06 | — | — | EP | claimed |
| EP-0216505-B1 | POLYIMIDES, PREPARATION OF POLYIMIDES AND BLENDS OF POLYIMIDES | ROHM AND HAAS COMPANY (US) | 1993-02-24 | — | — | EP | claimed |
| JP-8133754-A | — | — | None | — | — | JP | disclosed |
| EP-4590766-A1 | PHOTORESIN FORMULATIONS AND USE THEREOF FOR VOLUMETRIC ADDITIVE MANUFACTURING | National Research Council of Canada (CA) | 2025-07-30 | — | — | EP | disclosed |
| CN-119948373-A | Optical film | 大仓工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| CN-119895301-A | Optical film | 大仓工业株式会社 | 2025-04-25 | — | — | CN | disclosed |
| EP-0216505-A2 | Polyimides, preparation of polyimides and blends of polyimides | ROHM AND HAAS COMPANY (US) | 1987-04-01 | — | — | EP | disclosed |
| US-4581428-A | Process for preparing \"living\" polymers using tetracoordinate organosilicon, organotin or organogermanium polymerization initiator with bifluoride ion source co-catalyst | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-04-08 | — | — | US | disclosed |
| EP-0145263-A1 | Living polymers and process for their preparation | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-06-19 | — | — | EP | disclosed |
| US-4524196-A | Process for preparing \"living\" polymers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-06-18 | — | — | US | disclosed |
| US-4508880-A | ACRYLIC OR MALEIMIDE MONOMERS WITH ORGANOSILICON, (-TIN, OR-GERMANIUM) INITIATORS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-04-02 | — | — | US | disclosed |