⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12677139 | 1.00 | — | — | |
| Hydrogen Sulfide SCHEMBL15657642 | 0.97 | — | — | |
| SCHEMBL720412 | 0.80 | — | — | |
| SCHEMBL11492325 | 0.76 | TSHR (0.30) | — | |
| SCHEMBL15064229 | 0.76 | — | — | |
| SCHEMBL18414273 | 0.74 | — | — | |
| SCHEMBL23182686 | 0.72 | — | — | |
| SCHEMBL9965842 | 0.72 | — | — | |
| SCHEMBL715768 | 0.71 | — | — | |
| SCHEMBL719090 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118318208-A | Composition for forming catechol-containing drug solution resistant protective film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118276405-A | Composition for forming resist underlayer film comprising reaction product of acid dianhydride | 日产化学株式会社 | 2024-07-02 | — | — | CN | disclosed |
| US-20240176243-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240168385-A1 | PROTECTIVE FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-23 | — | — | US | disclosed |
| US-11976018-B2 | Diamine compound, method for manufacturing the same, and applications thereof | DAXIN MATERIALS CORP. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-11965059-B2 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| CN-117908332-A | Composition for forming resist underlayer film containing radical scavenger | 日产化学株式会社 | 2024-04-19 | — | — | CN | disclosed |
| US-20240118620-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING REACTION PRODUCT OF ACID DIANHYDRIDE | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240085792-A1 | FILM-FORMING COMPOSITION HAVING A MULTIPLE BOND | NISSAN CHEMICAL CORPORATION (JP) | 2024-03-14 | — | — | US | disclosed |
| CN-113383036-B | Composition for forming resist underlayer film containing radical scavenger | 日产化学株式会社 | 2024-02-23 | — | — | CN | disclosed |
| US-8778597-B2 | Long-chain alkylene-containing curable epoxy resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8722311-B2 | Positive resist composition and method for producing microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20130177763-A1 | ADHESIVE COMPOSITION CONTAINING RESIN HAVING CARBON-CARBON MULTIPLE BOND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-11 | — | — | US | disclosed |
| EP-2530524-A1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530098-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120295199-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120251955-A1 | COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20110319589-A1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110230058-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-09-22 | — | — | US | disclosed |