Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | CHRM2 | P08172 | 5/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 5/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 5/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 5/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2348753 | 0.81 | CHRM2 (0.62) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL25142240 | 0.79 | MEN1 (0.50) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL21705251 | 0.73 | MEN1 (0.43) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL7690579 | 0.71 | MEN1 (0.47) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL26426712 | 0.70 | MEN1 (0.44) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL2351669 | 0.67 | MEN1 (1.00) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL2351672 | 0.67 | MEN1 (1.00) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL6613830 | 0.67 | MEN1 (1.00) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL31255773 | 0.67 | MEN1 (1.00) | MEN1KMT2ACHRM2CHRM4CHRM1 | |
| SCHEMBL2351676 | 0.67 | MEN1 (1.00) | MEN1KMT2ACHRM2CHRM4CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20210302837-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |