SCHEMBL23906802

SCHEMBL23906802

Ic1cc(OC2CCCCO2)c(I)cc1OC1CCCCO1

nearest known ligand 0.43

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 6/20 0.35
KDM4C Q9H3R0 1/20 0.34
PDE4B Q07343 2/20 0.34
DHFR P00374 1/20 0.34
HSD11B1 P28845 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25637155 0.91 PDE4B (0.35) PTPN1KDM4CPDE4BDHFRHSD11B1
SCHEMBL23906796 0.91 PTPN1 (0.35) PTPN1KDM4CPDE4BDHFRHSD11B1
SCHEMBL397962 0.82 PDE4B (0.34) PTPN1KDM4CPDE4BDHFRNPC1
SCHEMBL723314 0.82 PDE4B (0.39) PTPN1KDM4CPDE4BDHFRHSD11B1
SCHEMBL26084988 0.82 ICAM1 (0.39) PTPN1KDM4CDHFRHSD11B1MEN1
SCHEMBL26342278 0.82 ICAM1 (0.33) KDM4CDHFRHSD11B1MEN1KMT2A
SCHEMBL12831493 0.81 PTPN1 (0.39) PTPN1KDM4CPDE4BDHFRHSD11B1
SCHEMBL1423598 0.81 KDM4C (0.37) PTPN1KDM4CPDE4BDHFRMEN1
SCHEMBL6788039 0.80 TSHR (0.38) PDE4BMEN1KMT2A
SCHEMBL25738033 0.80 NPC1 (0.45) PTPN1PDE4BHSD11B1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed