SCHEMBL23910

SCHEMBL23910

C[CH]COCCOCCOCCC

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 1/20 0.31
THRB P10828 1/20 0.31
HTT P42858 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPT P10636 1/20 0.31
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL568342 0.94
SCHEMBL939722 0.88 MEN1 (0.32) MEN1KMT2A
SCHEMBL9493115 0.84 TSHR (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL25664 0.84 TSHR (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL15303935 0.84 TSHR (0.48) MEN1THRBHTTKMT2AMAPT
SCHEMBL2255927 0.80
SCHEMBL618388 0.80 HSD17B10 (0.35) HSD17B10MEN1THRBHTTKMT2A
SCHEMBL116376 0.78 HSD17B10 (0.45) HSD17B10MEN1THRBHTTKMT2A
SCHEMBL7799602 0.78 HSD17B10 (0.45) HSD17B10MEN1THRBHTTKMT2A
SCHEMBL12570287 0.78 HSD17B10 (0.45) HSD17B10MEN1THRBHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024101085-A1 COMPOSITION FOR FORMING CATALYST LAYER, METHOD FOR PRODUCING CATALYST LAYER USING SAME, GAS DIFFUSION ELECTRODE AND ELECTROLYSIS CELL USING SAME マクセル株式会社 2024-05-16 WO claimed
US-20230203273-A1 LATEX COMPOSITION SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2023-06-29 US claimed
EP-4155343-A1 LATEX COMPOSITION Sumitomo Seika Chemicals Co., Ltd. (JP) 2023-03-29 EP claimed
EP-2291324-B1 PROCESS FOR PREPARING NANOCOMPOSITES CONSISTING OF CARBON NANOTUBE AND METAL BIONEER CORP (KR) 2018-11-07 EP claimed
US-9718132-B2 Manufacturing method of spherical gold (Au) nanoparticles and spherical gold (Au) nanoparticle manufactured by using the same KOREA BASIC SCIENCE INSTITUTE (KR) 2017-08-01 US claimed
US-9241434-B2 NANO composite consisting of carbon nanotubes and metal oxide and method for manufacturing the same BIONEER CORPORATION (KR) 2016-01-19 US claimed
US-20150290714-A1 MANUFACTURING METHOD OF SPHERICAL GOLD (AU) NANOPARTICLES AND SPHERICAL GOLD (AU) NANOPARTICLE MANUFACTURED BY USING THE SAME KOREA BASIC SCIENCE INSTITUTE (KR) 2015-10-15 US claimed
US-9096925-B2 Nanocomposites consisting of carbon nanotube and metal and a process for preparing the same BIONEER CORPORATION (KR) 2015-08-04 US claimed
US-20140291583-A1 NANO COMPOSITE CONSISTING OF CARBON NANOTUBES AND METAL OXIDE AND METHOD FOR MANUFACTURING THE SAME BIONEER CORPORATION (KR) 2014-10-02 US claimed
WO-2013048095-A1 NANO COMPOSITE CONSISTING OF CARBON NANOTUBES AND METAL OXIDE AND METHOD FOR MANUFACTURING THE SAME BIONEER CORPORATION (KR) 2013-04-04 WO claimed
WO-2012026686-A2 NANOCOMPOSITE INCLUDING CARBON NANOTUBES AND PLATINUM AND METHOD OF MANUFACTURING THE SAME BIONEER CORPORATION. (KR) 2012-03-01 WO claimed
US-20110081546-A1 NANOCOMPOSITES CONSISTING OF CARBON NANOTUBE AND METAL AND A PROCESS FOR PREPARING THE SAME BIONEER CORPORATION (KR) 2011-04-07 US claimed
EP-2291324-A1 NANOCOMPOSITES CONSISTING OF CARBON NANOTUBE AND METAL AND A PROCESS FOR PREPARING THE SAME Bioneer Corporation (KR) 2011-03-09 EP claimed
WO-2009145393-A1 NANOCOMPOSITES CONSISTING OF CARBON NANOTUBE AND METAL AND A PROCESS FOR PREPARING THE SAME BIONEER CORPORATION (KR) 2009-12-03 WO claimed
EP-0441502-B2 Lithographic plate finisher FUJI PHOTO FILM CO LTD (JP) 1998-08-26 EP claimed
EP-0441502-A2 Lithographic plate finisher FUJI PHOTO FILM CO., LTD. (JP) 1991-08-14 EP claimed
WO-2024116910-A1 COMPOSITION AND METHOD FOR ENHANCING SILICON NITRIDE POLISHING RATE SELECTIVITY 株式会社フジミインコーポレーテッド 2024-06-06 WO disclosed
WO-2024101085-A1 COMPOSITION FOR FORMING CATALYST LAYER, METHOD FOR PRODUCING CATALYST LAYER USING SAME, GAS DIFFUSION ELECTRODE AND ELECTROLYSIS CELL USING SAME マクセル株式会社 2024-05-16 WO disclosed
EP-0441502-B2 Lithographic plate finisher FUJI PHOTO FILM CO LTD (JP) 1998-08-26 EP disclosed
EP-0441502-A2 Lithographic plate finisher FUJI PHOTO FILM CO., LTD. (JP) 1991-08-14 EP disclosed