Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | TP53 | P04637 | 3/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | THRB | P10828 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28349127 | 0.93 | TSHR (0.56) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL2391946 | 0.93 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL11525518 | 0.88 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL29126988 | 0.85 | TSHR (0.48) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL5057282 | 0.80 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL21625764 | 0.79 | TSHR (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL13168076 | 0.78 | GABRR1 (0.34) | MMP1MMP2MMP3MMP9MMP13 | |
| SCHEMBL811744 | 0.77 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL26979856 | 0.77 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL16574651 | 0.77 | TDP1 (0.49) | TSHRALDH1A1HSD17B10CYP3A4SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 467 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117986997-A | Photocurable conductive black composition and method for forming cured product thereof | 杜邦电子公司 | 2024-05-07 | — | — | CN | claimed |
| CN-116209579-A | Pigment dispersant composition, method for producing same, pigment dispersion, and active energy ray-curable inkjet ink | 大日精化工业株式会社 | 2023-06-02 | — | — | CN | claimed |
| CN-116063021-A | Additive for hydraulic composition and hydraulic composition | 竹本油脂株式会社 | 2023-05-05 | — | — | CN | claimed |
| CN-111171761-B | Adhesive composition, and adhesive film and surface protective film using same | 藤森工业株式会社 | 2022-10-04 | — | — | CN | claimed |
| CN-114539471-A | Alkali soluble resin polymer and photosensitive resin composition, and preparation method and application thereof | 北京鼎材科技有限公司 | 2022-05-27 | — | — | CN | claimed |
| CN-114430749-A | Polymer latex for elastomer film production having excellent stress-holding properties and softness | 昕特玛私人有限公司 | 2022-05-03 | — | — | CN | claimed |
| CN-107272342-B | Negative photosensitive resin composition | 东友精细化工有限公司 | 2021-03-05 | — | — | CN | claimed |
| CN-105938299-B | Chemically amplified photosensitive resin composition and insulating film produced therefrom | 东友精细化工有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-107229188-B | Photosensitive resin composition | 东友精细化工有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-107219724-B | Chemically amplified positive photosensitive organic insulating film resin composition and insulating film | 东友精细化工有限公司 | 2020-07-14 | — | — | CN | claimed |
| CN-111171761-A | Adhesive composition, and adhesive film and surface protective film using same | 藤森工业株式会社 | 2020-05-19 | — | — | CN | claimed |
| CN-105785720-B | Photosensitive resin composition, photocured pattern formed therefrom, and image display device having the same | 东友精细化工有限公司 | 2020-02-07 | — | — | CN | claimed |
| CN-106444280-B | Negative-type photosensitive resin composition | 东友精细化工有限公司 | 2019-10-11 | — | — | CN | claimed |
| CN-107219724-A | Chemical amplification positive photonasty organic insulating film resin combination and dielectric film | 东友精细化工有限公司 | 2017-09-29 | — | — | CN | claimed |
| CN-106444280-A | Negative-type photosensitive resin comopsition | 东友精细化工有限公司 | 2017-02-22 | — | — | CN | claimed |
| CN-103454858-B | Color filter photosensitive coloring composition and color filter | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2016-03-09 | — | — | CN | claimed |
| CN-118355044-A | Active energy ray-curable resin composition, cured product, laminate, and article | DIC株式会社 | 2024-07-16 | — | — | CN | disclosed |
| CN-113874461-B | Curable resin composition, sealant for liquid crystal display element, vertical conduction material, and liquid crystal display element | 积水化学工业株式会社 | 2024-07-12 | — | — | CN | disclosed |
| WO-2002034851-A1 | QUATERNARY BORON COMPOUND POLYMERISATION INITIATORS, POLYMERISABLE COMPOSITIONS, AND USES THEREOF FOR BONDING LOW SURFACE ENERGY SUBSTRATES | LOCTITE (R & D) LIMITED (IE) | 2002-05-02 | — | — | WO | disclosed |
| WO-2002034852-A1 | METAL ALKYL BOROHYDRIDE POLYMERISATION INITIATORS, POLYMERISABLE COMPOSITIONS, AND USES THEREOF | LOCTITE (R & D) LIMITED (IE) | 2002-05-02 | — | — | WO | disclosed |