⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12203201 | 0.79 | — | — | |
| SCHEMBL135034 | 0.79 | — | — | |
| SCHEMBL12886357 | 0.79 | — | — | |
| SCHEMBL14627225 | 0.79 | — | — | |
| SCHEMBL8292965 | 0.79 | — | — | |
| SCHEMBL12820298 | 0.79 | — | — | |
| SCHEMBL9939506 | 0.79 | — | — | |
| SCHEMBL9938440 | 0.79 | — | — | |
| SCHEMBL11981484 | 0.79 | — | — | |
| SCHEMBL24425403 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11150556-B2 | Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-19 | — | — | US | disclosed |