⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1696174 | 0.97 | — | — | |
| SCHEMBL1701832 | 0.97 | — | — | |
| SCHEMBL1696049 | 0.97 | — | — | |
| SCHEMBL12244803 | 0.88 | — | — | |
| SCHEMBL17678859 | 0.86 | — | — | |
| SCHEMBL12244807 | 0.86 | — | — | |
| SCHEMBL12913027 | 0.84 | — | — | |
| SCHEMBL13397576 | 0.84 | — | — | |
| SCHEMBL14366859 | 0.84 | — | — | |
| SCHEMBL19728320 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 680 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119350686-A | Super-stain-resistant PVC coiled material with travertine patterns and production process thereof | 浙江金华天开电子材料有限公司 | 2025-01-24 | — | — | CN | claimed |
| EP-3858954-B1 | LUBRICANT FORMULATIONS WITH SILICON-CONTAINING COMPOUNDS | AFTON CHEMICAL CORP (US) | 2024-10-09 | — | — | EP | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| CN-111565859-B | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| CN-112915047-B | Anti-migration lip nourishing glaze | 浙江亦轩化妆品有限公司 | 2022-08-26 | — | — | CN | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| EP-3858954-A1 | LUBRICANT FORMULATIONS WITH SILICON-CONTAINING COMPOUNDS | Afton Chemical Corporation (US) | 2021-08-04 | — | — | EP | claimed |
| US-20210230500-A1 | LUBRICANT FORMULATIONS WITH SILICON-CONTAINING COMPOUNDS | AFTON CHEMICAL CORPORATION (US) | 2021-07-29 | — | — | US | claimed |
| EP-3830196-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2021-06-09 | — | — | EP | claimed |
| EP-1472263-B1 | USE OF SILOXANES AS EVAPORABLE SUPPORTS | GE BAYER SILICONES GMBH & CO (DE) | 2006-08-30 | — | — | EP | claimed |
| WO-2006013411-A1 | COSMETIC COMPOSITION FOR KERATIN FIBERS COMPRISING AN ALKYLTRISILOXANE | L'OREAL (FR) | 2006-02-09 | — | — | WO | claimed |
| WO-2006013415-A1 | COSMETIC COMPOSITION COMPRISING A CYCLIC SILICONE AND AN ALKYLTRISILOXANE | L'OREAL (FR) | 2006-02-09 | — | — | WO | claimed |
| WO-2006013413-A1 | COSMETIC COMPOSITION COMPRISING A VOLATILE LINEAR ALKYLTRISILOXANE | L'OREAL (FR) | 2006-02-09 | — | — | WO | claimed |
| WO-2006013414-A1 | COSMETIC COMPOSITION COMPRISING AN EMULSION COMPRISING AN ALKYLTRISILOXANE | L'OREAL (FR) | 2006-02-09 | — | — | WO | claimed |
| WO-2006013412-A1 | COSMETIC COMPOSITION COMPRISING AN APOLAR WAX AND AN ALKYLTRISILOXANE | L'OREAL (FR) | 2006-02-09 | — | — | WO | claimed |
| US-20050069564-A1 | Use of siloxanes as evaporable supports | MOMENTIVE PERFORMANCE MATERIALS INC. | 2005-03-31 | — | — | US | claimed |
| EP-1472263-A1 | USE OF SILOXANES AS EVAPORABLE SUPPORTS | GE Bayer Silicones GmbH & Co. KG (DE) | 2004-11-03 | — | — | EP | claimed |
| US-20040197284-A1 | Cosmetic composition comprising a volatile fatty phase | L'OREAL S.A. (FR) | 2004-10-07 | — | — | US | claimed |
| WO-2003042221-A1 | USE OF SILOXANES AS EVAPORABLE SUPPORTS | GE BAYER SILICONES GMBH & CO. KG (DE) | 2003-05-22 | — | — | WO | claimed |