SCHEMBL23940634

SCHEMBL23940634

Cc1cc(Cc2ccc(O)c(O)c2)ccc1O

nearest known ligand 0.87

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.87
ESR2 Q92731 1/20 0.87
CA1 P00915 1/20 0.74
CA2 P00918 1/20 0.74
CA4 P22748 1/20 0.74
CA6 P23280 1/20 0.74
IDH1 O75874 1/20 0.61
TRPA1 O75762 2/20 0.56
MAPT P10636 6/20 0.55
ALOX15 P16050 6/20 0.52
TP53 P04637 3/20 0.52
MAPK1 P28482 3/20 0.52
HIF1A Q16665 3/20 0.52
HSD17B10 Q99714 3/20 0.52
CYP1A2 P05177 2/20 0.52
NFKB1 P19838 2/20 0.52
THPO P40225 2/20 0.52
TSHR P16473 1/20 0.52
KDM4E B2RXH2 5/20 0.50
ALDH1A1 P00352 4/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29485633 0.93 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL36509 0.93 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL29357262 0.93 ESR1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL921295 0.89 ESR1 (0.83) ESR1ESR2CA1CA2CA4
SCHEMBL28112452 0.88 CA1 (0.68) ESR1ESR2CA1CA2CA4
SCHEMBL16436964 0.87 CA1 (0.74) ESR1ESR2CA1CA2CA4
SCHEMBL18085461 0.87 ESR1 (0.87) ESR1ESR2CA1CA2CA4
SCHEMBL108093 0.86 CA1 (1.00) ESR1ESR2CA1CA2CA4
SCHEMBL14549314 0.85 ESR1 (0.83) ESR1ESR2CA1CA2CA4
SCHEMBL6234291 0.85 ESR1 (0.83) ESR1ESR2CA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3896521-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
CN-1289966-C Positive photoetching gum composition and method for forming photoetching gum pattern using the same TOKYO APPLIED CHEMICAL IND CO (JP) 2006-12-13 CN disclosed
CN-1591185-A Positive photoetching gum composition and method for forming photoetching gum pattern using the same TOKYO APPLIED CHEMICAL IND CO (JP) 2005-03-09 CN disclosed