SCHEMBL239581

SCHEMBL239581

Cc1ccc(-n2ccnn2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NOTUM Q6P988 14/20 1.00
CYP19A1 P11511 1/20 0.54
KEAP1 Q14145 1/20 0.47
FLT3 P36888 2/20 0.43
HTT P42858 2/20 0.40
ALDH1A1 P00352 1/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27775660 0.98 NOTUM (0.96) NOTUMCYP19A1KEAP1FLT3HTT
SCHEMBL29084874 0.98 NOTUM (0.96) NOTUMCYP19A1KEAP1FLT3HTT
Sulfuric Acid SCHEMBL16338472 0.89 NOTUM (0.79) NOTUMCYP19A1KEAP1HTTALDH1A1
SCHEMBL10447781 0.89 NOTUM (0.78) NOTUMCYP19A1KEAP1
Morpholine SCHEMBL9237844 0.82 NOTUM (0.68) NOTUMCYP19A1KEAP1
SCHEMBL482167 0.78 NOTUM (0.64) NOTUMCYP19A1KEAP1
SCHEMBL8117312 0.78 NOTUM (0.64) NOTUMCYP19A1KEAP1
SCHEMBL76794 0.78 NOTUM (0.64) NOTUMCYP19A1KEAP1LMNAMAPT
SCHEMBL21777006 0.78 NOTUM (1.00) NOTUMCYP19A1KEAP1FLT3
SCHEMBL1186707 0.78 NOTUM (0.64) NOTUMCYP19A1KEAP1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 297 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12338151-B2 Treatment of azoles EVOQUA WATER TECHNOLOGIES LLC (US) 2025-06-24 US claimed
US-20240392194-A1 Post-Dry Etching Photoresist And Metal Containing Residue Removal Formulation VERSUM MATERIALS US, LLC 2024-11-28 US claimed
EP-4388069-A1 POST-DRY ETCHING PHOTORESIST AND METAL CONTAINING RESIDUE REMOVAL FORMULATION Versum Materials US, LLC (US) 2024-06-26 EP claimed
CN-118159635-A Post-drying etch photoresist and metal-containing residue removal formulation 弗萨姆材料美国有限责任公司 2024-06-07 CN claimed
EP-3688132-B1 STRIPPER SOLUTIONS AND METHODS OF USING STRIPPER SOLUTIONS VERSUM MAT US LLC (US) 2023-06-28 EP claimed
WO-2023049688-A1 POST-DRY ETCHING PHOTORESIST AND METAL CONTAINING RESIDUE REMOVAL FORMULATION VERSUM MATERIALS US, LLC (US) 2023-03-30 WO claimed
CN-111356759-B Stripper solution and method of using stripper solution 弗萨姆材料美国有限责任公司 2022-12-20 CN claimed
US-20220298045-A1 Treatment of Azoles EVOQUA WATER TECHNOLOGIES LLC (US) 2022-09-22 US claimed
CN-115044375-A Etching composition 富士胶片电子材料美国有限公司 2022-09-13 CN claimed
CN-114940926-A Cleaning preparation 弗萨姆材料美国有限责任公司 2022-08-26 CN claimed
US-6897150-B1 Semiconductor wafer surface and method of treating a semiconductor wafer surface NEC ELECTRONICS CORPORATION (JP) 2005-05-24 US claimed
CN-1200990-C Monocarboxylic acid based antifreeze composition for diesel engines ASHLAND INC (US) 2005-05-11 CN claimed
EP-1159372-A4 MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES ASHLAND INC (US) 2005-03-16 EP claimed
US-6833109-B1 Method and apparatus for storing a semiconductor wafer after its CMP polishing NEC ELECTRONICS CORPORATION (JP) 2004-12-21 US claimed
CN-1501971-A Hydraulic fluids with improved anti-corrosion properties �����ɷ� 2004-06-02 CN claimed
EP-1392790-A1 MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION Ashland Inc. (US) 2004-03-03 EP claimed
WO-2002090460-A1 MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION ASHLAND INC. (US) 2002-11-14 WO claimed
EP-1159372-A1 MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES Ashland Inc. (US) 2001-12-05 EP claimed
CN-1284984-A silicate-free antifreeze composition ASHLAND INC (US) 2001-02-21 CN claimed
WO-2000050532-A1 MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES ASHLAND INC. (US) 2000-08-31 WO claimed