SCHEMBL23960745

SCHEMBL23960745

CC(C)(C)CC(c1ccc(O)c2ncccc12)C(C)(C)C

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2C19 P33261 1/20 0.53
▸ HIF1A Q16665 1/20 0.53
▸ HTT P42858 4/20 0.50
▸ COMT P21964 3/20 0.50
▸ SLC6A2 P23975 1/20 0.50
▸ KDM4E B2RXH2 6/20 0.49
▸ L3MBTL1 Q9Y468 4/20 0.49
▸ NPC1 O15118 3/20 0.49
▸ RAB9A P51151 3/20 0.49
▸ LMNA P02545 3/20 0.49
▸ GAA P10253 1/20 0.49
▸ SMN1; SMN2 Q16637 1/20 0.49
▸ IDO1 P14902 3/20 0.47
▸ ALOX12 P18054 2/20 0.47
▸ NPSR1 Q6W5P4 1/20 0.47
▸ MAPT P10636 3/20 0.46
▸ HSP90AA1 P07900 2/20 0.46
▸ MPI P34949 1/20 0.46
▸ BRD4 O60885 1/20 0.46
▸ METAP2 P50579 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13797358 0.77 CYP2C19 (0.62) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL11277500 0.75 CYP2C19 (0.60) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL24716144 0.73 KDM4E (0.61) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL28124508 0.73 CYP2C19 (0.66) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL28124509 0.73 CYP2C19 (0.66) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL14318441 0.72 CDK2 (0.37) HIF1ASLC6A2KDM4ERAB9ALMNA
SCHEMBL14456227 0.72 CYP2C19 (0.64) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL5595468 0.72 KDM4E (0.54) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL8335177 0.71 HSP90AA1 (0.57) CYP2C19HIF1AHTTCOMTSLC6A2
SCHEMBL27527427 0.71 HTT (0.57) HTTCOMTSLC6A2KDM4EL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210333710-A1 Photoresist Composition, its Manufacturing Method, and Manufacturing Methods of Metal Pattern and Array Substrate HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2021-10-28 — — US disclosed
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