SCHEMBL2401600

SCHEMBL2401600

C=CC1(C)CC=Cc2ccccc21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9663013 0.82 HTR2A (0.31)
SCHEMBL29495763 0.75
SCHEMBL258243 0.75 KDM4E (0.32)
SCHEMBL30320303 0.75 HIF1A (0.33)
SCHEMBL4369386 0.75 HIF1A (0.33)
SCHEMBL21385202 0.75 POLB (0.30)
Pyridine SCHEMBL9664383 0.73
SCHEMBL31693139 0.72
SCHEMBL4423345 0.72
SCHEMBL7873676 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 293 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4744901-A1 ON-PRESS DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, PLANOGRAPHIC PRINTING METHOD, AND COMPOUND FUJIFILM Corporation (JP) 2026-05-20 EP disclosed
EP-4744902-A1 ON-PRESS DEVELOPMENT-TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLANOGRAPHIC PRINTING PLATE PRODUCTION METHOD, AND PLANOGRAPHIC PRINTING METHO FUJIFILM Corporation (JP) 2026-05-20 EP disclosed
US-20260131567-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING METHOD, AND COMPOUND FUJIFILM CORPORATION (JP) 2026-05-14 US disclosed
US-20260131566-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION (JP) 2026-05-14 US disclosed
EP-4223538-B1 INKJET RECORDING METHOD FUJIFILM CORP (JP) 2026-04-15 EP disclosed
EP-4223537-B1 INK-JET INK AND INK-JET RECORDING METHOD FUJIFILM CORP (JP) 2026-04-15 EP disclosed
EP-4036123-B1 PARTICLE, AQUEOUS DISPERSION, INK JET INK, FILM-FORMING METHOD, AND IMAGE-FORMING METHOD FUJIFILM CORP (JP) 2026-04-01 EP disclosed
EP-4186708-B1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORP (JP) 2026-03-04 EP disclosed
EP-3660111-B1 INK COMPOSITION, METHOD FOR PRODUCING SAME, AND IMAGE FORMATION METHOD FUJIFILM CORP (JP) 2026-02-18 EP disclosed
EP-4349602-B1 ON-MACHINE DEVELOPMENT TYPE NEGATIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING A PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD FUJIFILM CORP (JP) 2025-11-12 EP disclosed
CN-101313036-A Thiacridone derivatives as dispersion synergists AGFA GRAPHICS NV (BE) 2008-11-26 CN disclosed
CN-101313035-A Naphthol AS colorants and their use AGFA GRAPHICS NV (BE) 2008-11-26 CN disclosed
CN-101313040-A Non-aqueous quinacridone dispersions using dispersion synergists AGFA GRAPHICS NV (BE) 2008-11-26 CN disclosed
EP-1986257-A1 POLYELECTROLYTE FILM, FILM-ELECTRODE ASSEMBLY, AND SOLID-POLYMER-TYPE FUEL CELL Kuraray Co., Ltd. (JP) 2008-10-29 EP disclosed
CN-101154042-A Curing composition for nano-imprint lithography and pattern forming method using the same FUJIFILM CORP (JP) 2008-04-02 CN disclosed
US-20080014505-A1 POLYMER ELECTROCHEMICAL DEVICE KURARAY CO., LTD. (JP) 2008-01-17 US disclosed
CN-101105625-A Light solidifying composition and pattern forming method using the same FUJIFILM CORP (JP) 2008-01-16 CN disclosed
EP-1870597-A2 Polymer electrochemical device Kuraray Co., Ltd. (JP) 2007-12-26 EP disclosed
CN-1688453-A Authentication identification card and method for manufacturing authentication identification card KONICA MINOLTA PHOTO IMAGING (JP) 2005-10-26 CN disclosed
CN-1497497-A Method for producing authentication identification card and transfer foil for protecting card surface used for the same 柯尼卡美能达控股株式会社 2004-05-19 CN disclosed