⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2397986 | 0.80 | — | — | |
| SCHEMBL7931775 | 0.80 | — | — | |
| SCHEMBL5005170 | 0.79 | — | — | |
| SCHEMBL14998212 | 0.77 | — | — | |
| SCHEMBL18255499 | 0.73 | — | — | |
| SCHEMBL7628008 | 0.73 | — | — | |
| SCHEMBL10969015 | 0.72 | — | — | |
| SCHEMBL18255494 | 0.72 | — | — | |
| SCHEMBL106946 | 0.71 | — | — | |
| SCHEMBL18255500 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | disclosed |
| US-11033507-B2 | Method of synthesis of silica vesicles and use thereof | THE UNIVERSITY OF QUEENSLAND (AU) | 2021-06-15 | — | — | US | disclosed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | disclosed |
| US-20180193278-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | THE UNIVERSITY OF QUEENSLAND (AU) | 2018-07-12 | — | — | US | disclosed |
| EP-3083765-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | The University Of Queensland (AU) | 2016-10-26 | — | — | EP | disclosed |
| WO-2015089590-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | THE UNIVERSITY OF QUEENSLAND (AU) | 2015-06-25 | — | — | WO | disclosed |
| US-8734906-B2 | Films and method of production thereof | BRISMAT INC. (US) | 2014-05-27 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20110223329-A1 | Films and method of production thereof | UNIVERSITY OF QUEENSLAND (AU) | 2011-09-15 | — | — | US | disclosed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-20050260420-A1 | Low dielectric materials and methods for making same | VERSUM MATERIALS US, LLC | 2005-11-24 | — | — | US | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |