Acetic Acid

Acetic Acid

SCHEMBL2402864

CC(=O)O.CC(=O)O.CC(=O)O.NCCNCCO.[Na]

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 4/20 0.46
CA6 P23280 4/20 0.46
CA7 P43166 4/20 0.46
CA9 Q16790 4/20 0.46
CA14 Q9ULX7 4/20 0.46
CA5B Q9Y2D0 4/20 0.46
MEN1 O00255 2/20 0.46
RECQL P46063 2/20 0.46
KMT2A Q03164 2/20 0.46
PAOX Q6QHF9 5/20 0.44
TDP1 Q9NUW8 3/20 0.43
CA2 P00918 3/20 0.43
CA4 P22748 3/20 0.43
CA5A P35218 3/20 0.43
LMNA P02545 2/20 0.43
CA3 P07451 2/20 0.43
ALDH1A1 P00352 2/20 0.43
ALOX15 P16050 2/20 0.43
CA1 P00915 1/20 0.43
TP53 P04637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL2873747 1.00 CA12 (0.46) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL1628251 1.00 CA12 (0.46) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL10888535 0.98 CA12 (0.43) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL10889398 0.98 CA12 (0.43) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL10888524 0.98 CA12 (0.43) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL9238796 0.98 CA12 (0.48) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL10585174 0.98 CA12 (0.48) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL2167992 0.98 CA12 (0.48) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL20388 0.98 CA12 (0.48) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL3149055 0.98 CA12 (0.48) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118112260-A Method for semi-quantitatively detecting concentration of hemoglobin in feces 杭州奥泰生物技术股份有限公司 2024-05-31 CN claimed
CN-116782867-A Cosmetic material 株式会社资生堂 2023-09-19 CN claimed
CN-115874184-A Organic film removing liquid and preparation method thereof 上海富柏化工有限公司 2023-03-31 CN claimed
EP-0799085-A1 H 2S ABSORPTION WITH SUBSEQUENT OXALATE REMOVAL THE DOW CHEMICAL COMPANY (US) 1997-10-08 EP claimed
WO-1996019280-A1 H2S ABSORPTION WITH SUBSEQUENT OXALATE REMOVAL THE DOW CHEMICAL COMPANY (US) 1996-06-27 WO claimed
US-4316824-A NONIONIC SURFACTANTS THE PROCTER & GAMBLE COMPANY (US) 1982-02-23 US claimed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
CN-118209722-A Colloidal gold test paper for detecting fecal occult blood by double windows and application thereof 杭州奥泰生物技术股份有限公司 2024-06-18 CN disclosed
CN-118112260-A Method for semi-quantitatively detecting concentration of hemoglobin in feces 杭州奥泰生物技术股份有限公司 2024-05-31 CN disclosed
EP-3425658-B1 METHOD FOR POLISHING SILICON SUBSTRATE FUJIMI INC (JP) 2024-04-03 EP disclosed
CN-117778117-A Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate 福吉米株式会社 2024-03-29 CN disclosed
US-11897081-B2 Method for polishing silicon substrate and polishing composition set FUJIMI INCORPORATED (JP) 2024-02-13 US disclosed
CN-114450376-B Polishing composition 福吉米株式会社 2024-01-05 CN disclosed
US-6786588-B2 Pretreatment liquid for recording material and image recording method using the pretreatment liquid RICOH COMPANY LIMITED (JP) 2004-09-07 US disclosed
EP-1243435-B1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid RICOH KK (JP) 2004-06-09 EP disclosed
US-20030064206-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid RICOH COMPANY LIMITED (JP) 2003-04-03 US disclosed
EP-1243435-A1 Pretreatment liquid for recording material and image recording method using the pretreatment liquid Ricoh Company, Ltd. (JP) 2002-09-25 EP disclosed
EP-0184381-B1 ELECTROCHEMICAL PROCESS AND CELL THE DOW CHEMICAL COMPANY (US) 1989-05-31 EP disclosed
US-4652350-A Electrochemical process THE DOW CHEMICAL COMPANY (US) 1987-03-24 US disclosed
EP-0184381-A1 Electrochemical process and cell THE DOW CHEMICAL COMPANY (US) 1986-06-11 EP disclosed