Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1473219 | 0.81 | TSHR (0.63) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL5605430 | 0.81 | TSHR (0.63) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL5089974 | 0.81 | TSHR (0.63) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL1521320 | 0.79 | TSHR (0.61) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL27976578 | 0.79 | TSHR (0.61) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL23909439 | 0.78 | TSHR (0.65) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL20262429 | 0.78 | TSHR (0.71) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL2240011 | 0.78 | TSHR (0.59) | TSHRALDH1A1SMN1; SMN2HPGDRAB9A | |
| SCHEMBL1060689 | 0.78 | TSHR (0.59) | TSHRALDH1A1SMN1; SMN2HPGDTDP1 | |
| SCHEMBL29012829 | 0.78 | TSHR (0.59) | TSHRALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021231517-A1 | CURABLE OXAMATE ESTERS AND FORMULATIONS MADE THEREFROM | Henkel IP & Holding GmbH (DE) | 2021-11-18 | — | — | WO | disclosed |
| CN-109970890-A | Non-metallocene catalyst and preparation method and application | 北京国达恒泰科贸有限责任公司 | 2019-07-05 | — | — | CN | disclosed |
| CN-103154042-B | Photoetching technique multipolymer and manufacture method thereof, anti-corrosion agent composition, forms the manufacture method of the substrate of pattern, the evaluation method of multipolymer, multipolymer composition analytic method | MITSUBISHI RAYON CO.,LTD. (JP) | 2015-12-16 | — | — | CN | disclosed |
| CN-103154042-A | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI RAYON CO | 2013-06-12 | — | — | CN | disclosed |
| CN-1930194-B | Resist polymer, resist composition, method for producing pattern, and raw material compound for resist polymer | MITSUBISHI RAYON CO | 2011-03-30 | — | — | CN | disclosed |
| CN-101823989-A | Resist with polymkeric substance, resist composition and method of manufacturing pattern and resist with the polymkeric substance starting compound | MITSUBISHI RAYON CO | 2010-09-08 | — | — | CN | disclosed |
| CN-1976962-B | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO | 2010-06-23 | — | — | CN | disclosed |
| CN-1976962-A | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO (JP) | 2007-06-06 | — | — | CN | disclosed |
| CN-1930194-A | Resist polymer, resist composition, method for producing pattern, and raw material compound for resist polymer | MITSUBISHI RAYON CO (JP) | 2007-03-14 | — | — | CN | disclosed |